SCHEMBL20955828

SCHEMBL20955828

ClC(Cl)(Cl)C(Cl)(Cl)c1[c]cccc1C(Cl)(Cl)C(Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20955825 0.78
SCHEMBL18242525 0.74
SCHEMBL1234547 0.73
SCHEMBL18242294 0.72
SCHEMBL12816685 0.65 TSHR (0.38)
SCHEMBL18242107 0.65 CYP2A6 (0.36)
SCHEMBL1235498 0.65
SCHEMBL21354744 0.64 CYP3A4 (0.33)
SCHEMBL125906 0.64 CA2 (0.41)
SCHEMBL82438 0.64 TDP1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11370751-B2 Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof SAN APRO LTD. (JP) 2022-06-28 US disclosed
CN-114502613-A Curable composition, cured product, and method for forming cured product 东京应化工业株式会社 2022-05-13 CN disclosed
US-20210189080-A1 COMPOSITION FOR FORMING HARD COAT, METHOD FOR PRODUCING ARTICLE HAVING HARD COAT, HARD COAT, HARD-COATED ARTICLE, AND SILANE-MODIFIED ALICYCLIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-24 US disclosed
WO-2021065796-A1 CURABLE COMPOSITION, CURED MATERIAL, AND METHOD FOR FORMING CURED MATERIAL 東京応化工業株式会社 2021-04-08 WO disclosed
US-10683266-B2 Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof SAN APRO LTD. (JP) 2020-06-16 US disclosed
US-20190300476-A1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF SAN-APRO LTD. (JP) 2019-10-03 US disclosed
US-20190284134-A1 SULFONIUM SALT, HEAT- OR PHOTO-ACID GENERATOR, HEAT- OR PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT THEREOF SAN APRO LTD. (JP) 2019-09-19 US disclosed
EP-3492476-A1 SULFONIUM SALT, HEAT- OR PHOTO-ACID GENERATOR, HEAT-CURABLE OR PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF San-Apro Ltd. (JP) 2019-06-05 EP disclosed
EP-3480205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF San-Apro Ltd. (JP) 2019-05-08 EP disclosed