Acrylic Acid

Acrylic Acid

SCHEMBL209597

C=CC(=O)O.OCCCCCCCCCO

nearest known ligand 0.59

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.59
▸ GPR84 Q9NQS5 1/20 0.50
▸ FFAR1 O14842 1/20 0.50
▸ FFAR4 Q5NUL3 1/20 0.50
▸ HSD17B10 Q99714 2/20 0.42
▸ ALOX15 P16050 1/20 0.42
▸ CAMK2A Q9UQM7 1/20 0.41
▸ ALDH1A1 P00352 7/20 0.39
▸ TSHR P16473 6/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ FNTA P49354 1/20 0.38
▸ FNTB P49356 1/20 0.38
▸ ABCC4 O15439 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ MEN1 O00255 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ KDM4E B2RXH2 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ FGFR4 P22455 1/20 0.33
▸ ZDHHC20 Q5W0Z9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL8532587 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL8530268 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL7629881 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
1,5-Pentanediol SCHEMBL1321675 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL491630 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL25361515 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL35063 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
1,6-Hexanediol SCHEMBL107615 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
Acrylic Acid SCHEMBL21496134 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10
1,5-Pentanediol SCHEMBL11317241 1.00 LMNA (0.59) LMNAGPR84FFAR1FFAR4HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116924912-A Molecule for improving hair toughness and application thereof 江南大学 2023-10-24 — — CN claimed
WO-2022228846-A1 METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER BASF SE (DE) 2022-11-03 — — WO claimed
US-8148457-B2 Adhesive composition and film adhesive TOKYO OHTA KOGYO CO., LTD. (JP) 2012-04-03 — — US claimed
US-20100178497-A1 ADHESIVE COMPOSITION, FILM ADHESIVE, AND PROCESS FOR PRODUCTION OF THE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2010-07-15 — — US claimed
US-20100075141-A1 ADHESIVE COMPOSITION AND FILM ADHESIVE TOKYO OHKA KOGYO CO., LTD. (JP) 2010-03-25 — — US claimed
CN-1206280-C Radiation curable resin composition DSM NV (NL) 2005-06-15 — — CN claimed
CN-1297460-A Radiation curable resin composition DSM NV (NL) 2001-05-30 — — CN claimed
US-4192684-A Photosensitive compositions containing hydrogenated 1,2-polybutadiene ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-03-11 — — US claimed
EP-3778793-B1 CURABLE COMPOSITION FOR INKJET PRINTING, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT HAVING THE CURED PRODUCT TAIYO HOLDINGS CO LTD (JP) 2025-08-27 — — EP disclosed
CN-115362184-B Curable composition, cured product, and electronic component 太阳控股株式会社 2024-07-12 — — CN disclosed
CN-116924912-A Molecule for improving hair toughness and application thereof 江南大学 2023-10-24 — — CN disclosed
WO-2023176259-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INSULATING FILM 日産化学株式会社 2023-09-21 — — WO disclosed
US-11724423-B2 Mold release film and method for producing laminate MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-15 — — US disclosed
CN-116547326-A Curable composition, cured product, and electronic component 太阳油墨制造株式会社 2023-08-04 — — CN disclosed
US-5663264-A OF A COPOLYMER CONTAINING AN ALKYLENE OXIDE MONOMER, A POLYFUNCTIONAL (METH)ACRYLATE MONOMER AND A VINYL MONOMER HITACHI CHEMICAL COMPANY, LTD. (JP) 1997-09-02 — — US disclosed
EP-0786700-A1 PHOTOSENSITIVE ELASTOMER COMPOSITION AND PHOTOSENSITIVE RUBBER PRINTING PLATE NIPPON ZEON CO., LTD. (JP) 1997-07-30 — — EP disclosed
EP-0751433-A2 Release composition and photosensitive rubber plate with layer of the same NIPPON ZEON CO., LTD. (JP) 1997-01-02 — — EP disclosed
US-5583191-A FORMED OF TRANSPARENT RESIN OBTAINED BY POLYMERIZING MONOMER HAVING ALKYLENE OXIDE GROUP, POLYFUNCTIONAL (METH)ACRYLATE HAVING DIVALENT BRANCED HYDROCARBON GROUP, OPTIONAL ADDITIONAL VINYL MONOMER; HEAT RESISTANCE HITACHI CHEMICAL COMPANY, LTD. (JP) 1996-12-10 — — US disclosed
EP-0661307-A2 Transparent resin and plastic lens HITACHI CHEMICAL CO., LTD. (JP) 1995-07-05 — — EP disclosed
US-4192684-A Photosensitive compositions containing hydrogenated 1,2-polybutadiene ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-03-11 — — US disclosed
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