Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAALAD2 | Q9Y3Q0 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11806205 | 0.81 | ALDH1A1 (0.45) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL6468564 | 0.79 | NAALAD2 (0.38) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL28052261 | 0.77 | FFAR3 (0.37) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL28235302 | 0.75 | NAALAD2 (0.45) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL11802531 | 0.75 | AKR1B1 (0.48) | ALDH1A1MEN1KMT2AESR1TSHR | |
| SCHEMBL29199855 | 0.73 | ALDH1A1 (0.35) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL12410508 | 0.73 | NAALAD2 (0.43) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL27609218 | 0.73 | NAALAD2 (0.43) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL22440740 | 0.72 | ALDH1A1 (0.41) | NAALAD2ALDH1A1MEN1CYP1A2THRB | |
| SCHEMBL12319731 | 0.72 | ALDH1A1 (0.38) | NAALAD2ALDH1A1MEN1CYP1A2THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12025919-B2 | Method of storing photoresist coated substrates and semiconductor substrate container arrangement | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-07-02 | — | — | US | disclosed |
| US-11977333-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-11971657-B2 | Photoresist developer and method of developing photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| US-20240118618-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-11 | — | — | US | disclosed |
| US-20240096623-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-21 | — | — | US | disclosed |
| US-20240079235-A1 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-03-07 | — | — | US | disclosed |
| US-11842896-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-12 | — | — | US | disclosed |
| US-20230393475-A1 | METALLIC PHOTORESIST PATTERNING AND DEFECT IMPROVEMENT | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-12-07 | — | — | US | disclosed |
| US-20230393474-A1 | PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-07 | — | — | US | disclosed |
| US-20230384679-A1 | PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-30 | — | — | US | disclosed |
| US-20110020755-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-7842452-B2 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2010-11-30 | — | — | US | disclosed |
| US-20090123880-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20090042147-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| US-7482112-B2 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2009-01-27 | — | — | US | disclosed |
| US-20080318171-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| EP-2003504-A2 | Method of forming patterns | FUJIFILM Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| EP-2003505-A2 | Method of forming patterns | FUJIFILM Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20070172768-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1811338-A2 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |