SCHEMBL2098595

SCHEMBL2098595

Cc1ccccc1C(C)[SiH](Cl)Cl

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.48
ACHE P22303 2/20 0.41
TSHR P16473 1/20 0.41
ACP3 P15309 1/20 0.37
SLC6A2 P23975 2/20 0.35
SLC6A4 P31645 2/20 0.35
SLC6A3 Q01959 2/20 0.35
GAA P10253 1/20 0.35
ADRA2A P08913 2/20 0.35
ADRA2B P18089 2/20 0.35
ADRA2C P18825 1/20 0.35
GABRA1 P14867 1/20 0.34
GABRB2 P47870 1/20 0.34
ALDH1A1 P00352 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
HRH2 P25021 2/20 0.33
OPRM1 P35372 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3163010 0.76 ESR1 (0.48) ESR1ACHETSHRACP3SLC6A2
SCHEMBL7783992 0.75 ESR1 (0.52) ESR1ACHETSHRACP3SLC6A2
SCHEMBL38664948 0.75 ESR1 (0.52) ESR1ACHETSHRACP3SLC6A2
SCHEMBL840826 0.74 ESR1 (0.46) ESR1ACHETSHRACP3SLC6A2
SCHEMBL9078518 0.74 ESR1 (0.42) ESR1ACHETSHRACP3SLC6A2
SCHEMBL5493731 0.74 ESR1 (0.56) ESR1ACHETSHRACP3SLC6A2
SCHEMBL29392590 0.74 ESR1 (0.56) ESR1ACHETSHRACP3SLC6A2
SCHEMBL146510 0.74 ESR1 (0.56) ESR1ACHETSHRACP3SLC6A2
SCHEMBL6546306 0.74 ESR1 (0.56) ESR1ACHETSHRACP3SLC6A2
SCHEMBL40597 0.74 ESR1 (0.56) ESR1ACHETSHRACP3SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8163460-B2 Underlayer coating forming composition for lithography containing polysilane compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-04-24 US disclosed
US-20080318158-A1 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-25 US disclosed