⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2103099 | 0.67 | — | — | |
| Alcohol SCHEMBL9066189 | 0.63 | — | — | |
| Alcohol SCHEMBL4389824 | 0.60 | — | — | |
| SCHEMBL467719 | 0.59 | — | — | |
| SCHEMBL3810465 | 0.59 | — | — | |
| Trichlorethanol SCHEMBL1027 | 0.56 | — | — | |
| SCHEMBL467505 | 0.56 | — | — | |
| SCHEMBL301860 | 0.56 | — | — | |
| SCHEMBL10500656 | 0.56 | — | — | |
| SCHEMBL17423480 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101180579-B | Polysilane compound-containing lower layer film forming composition for lithography | NISSAN CHEMICAL IND LTD | 2012-06-27 | — | — | CN | disclosed |
| US-8163460-B2 | Underlayer coating forming composition for lithography containing polysilane compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20080318158-A1 | Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| CN-101180579-A | Polysilane compound-containing lower layer film forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2008-05-14 | — | — | CN | disclosed |