SCHEMBL2099723

SCHEMBL2099723

CCCCC=C[SiH](Cl)N(C)C

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
ALDH1A1 P00352 1/20 0.32
F7 P08709 1/20 0.31
F3 P13726 1/20 0.31
FAAH O00519 2/20 0.31
TRPV1 Q8NER1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2099544 0.81 TSHR (0.31) TSHRALDH1A1F7F3FAAH
SCHEMBL2101881 0.77 TSHR (0.35) TSHRALDH1A1F7F3FAAH
SCHEMBL2102336 0.77
SCHEMBL31028405 0.75
SCHEMBL15302613 0.72
SCHEMBL2102925 0.71 TSHR (0.30) TSHRALDH1A1
SCHEMBL8992283 0.71 TSHR (0.41) TSHRALDH1A1F7F3FAAH
SCHEMBL3481689 0.70 LPAR3 (0.35) TSHRALDH1A1F7F3FAAH
SCHEMBL5084698 0.70 TSHR (0.32) TSHRALDH1A1F7F3FAAH
SCHEMBL2101110 0.70 TSHR (0.32) TSHRALDH1A1F7F3FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed