SCHEMBL2102289

SCHEMBL2102289

CCCC[Si](Cl)(Cl)C(C)C

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.32
TDP1 Q9NUW8 1/20 0.32
LMNA P02545 1/20 0.32
OPRM1 P35372 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27659927 0.90 TSHR (0.40) TSHRLMNAOPRM1THRB
SCHEMBL706562 0.85
SCHEMBL703933 0.85
SCHEMBL2100507 0.82
SCHEMBL2102646 0.79
SCHEMBL702797 0.78
SCHEMBL4644804 0.78 TSHR (0.32) TSHRTDP1LMNAOPRM1THRB
SCHEMBL2269105 0.78 TSHR (0.33) TSHRTDP1LMNAOPRM1THRB
SCHEMBL2273603 0.74 TSHR (0.31) TSHR
SCHEMBL30173776 0.72 TSHR (0.32) TSHRTDP1LMNAOPRM1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115353575-B Main catalyst and catalyst for preparing ultra-high molecular weight polypropylene, preparation method and application 上海化工研究院有限公司 2023-08-29 CN disclosed
CN-115353575-A Main catalyst and catalyst for preparing ultrahigh molecular weight polypropylene, preparation method and application 上海化工研究院有限公司 2022-11-18 CN disclosed
CN-107001517-A Polyethylene homo-or copolymers with improved abrasion resistance SABIC环球技术有限责任公司 2017-08-01 CN disclosed
CN-107001518-A Carbon monoxide-olefin polymeric for olefinic polymerization SABIC环球技术有限责任公司 2017-08-01 CN disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
EP-1999167-A2 ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR Novolen Technology Holdings, C.V. (NL) 2008-12-10 EP disclosed
WO-2007106348-A2 ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) 2007-09-20 WO disclosed
US-20070213204-A1 Ziegler-Natta catalyst with in situ-generated donor NOVOLEN TECHNOLOGY HOLDINGS C.V. 2007-09-13 US disclosed