SCHEMBL2102318

SCHEMBL2102318

CN[SiH](C)NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21851767 0.80
SCHEMBL432068 0.71
SCHEMBL2739831 0.69
SCHEMBL7370700 0.67
Potassium SCHEMBL3850422 0.67
Hydrochloric Acid SCHEMBL27258623 0.67
Lithium SCHEMBL2527079 0.67
SCHEMBL2103904 0.63
Dimethylamine SCHEMBL668291 0.63
SCHEMBL254059 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0384183-B1 Mixtures comprising silanol-terminated polydiorganosiloxane and processes GEN ELECTRIC (US) 1995-08-02 EP claimed
EP-0104179-B1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES GENERAL ELECTRIC COMPANY (US) 1991-01-02 EP claimed
EP-0384183-A2 Mixtures comprising silanol-terminated polydiorganosiloxane and processes GENERAL ELECTRIC COMPANY (US) 1990-08-29 EP claimed
EP-0104179-A4 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. GEN ELECTRIC (US) 1984-07-24 EP claimed
EP-0104179-A1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. GEN ELECTRIC (US) 1984-04-04 EP claimed
US-4417042-A Scavengers for one-component alkoxy-functional RTV compositions and processes GENERAL ELECTRIC COMPANY (US) 1983-11-22 US claimed
WO-1983002948-A1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES GEN ELECTRIC (US) 1983-09-01 WO claimed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
EP-0384183-B1 Mixtures comprising silanol-terminated polydiorganosiloxane and processes GEN ELECTRIC (US) 1995-08-02 EP disclosed
EP-0104179-B1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES GENERAL ELECTRIC COMPANY (US) 1991-01-02 EP disclosed
US-4489200-A One-component RTV silicone rubber compositions with good self-bonding properties to acrylate plastics GENERAL ELECTRIC COMPANY (US) 1984-12-18 US disclosed
EP-0104179-A4 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. GEN ELECTRIC (US) 1984-07-24 EP disclosed
EP-0104179-A1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. GEN ELECTRIC (US) 1984-04-04 EP disclosed
US-4417042-A Scavengers for one-component alkoxy-functional RTV compositions and processes GENERAL ELECTRIC COMPANY (US) 1983-11-22 US disclosed
WO-1983002948-A1 SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES GEN ELECTRIC (US) 1983-09-01 WO disclosed
US-4208492-A ENGINEERING THERMOPLASTIC ELASTOMERS UNION CARBIDE CORPORATION (US) 1980-06-17 US disclosed
US-4145504-A High temperature carborane-siloxane elastomers intermediate polymeric products and process for preparation UNION CARBIDE CORPORATION (US) 1979-03-20 US disclosed