⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL5164633 | 0.76 | — | — | |
| Dimethylamine SCHEMBL13695986 | 0.76 | — | — | |
| Dimethylamine SCHEMBL12415750 | 0.76 | — | — | |
| Dimethylamine SCHEMBL1030 | 0.76 | — | — | |
| Dimethylamine SCHEMBL392668 | 0.76 | — | — | |
| SCHEMBL29016 | 0.76 | — | — | |
| Dimethylamine SCHEMBL1330452 | 0.76 | — | — | |
| Dimethylamine SCHEMBL11567323 | 0.68 | — | — | |
| Dimethylamine SCHEMBL1003093 | 0.68 | KDM4E (0.38) | — | |
| Dimethylamine SCHEMBL6866705 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 317 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240213093-A1 | CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2024-06-27 | — | — | US | claimed |
| WO-2024137050-A1 | CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2024-06-27 | — | — | WO | claimed |
| CN-113594171-B | Integrated assembly and method of forming an integrated assembly | 美光科技公司 | 2024-06-18 | — | — | CN | claimed |
| US-20240157335-A1 | STATIONARY PHASE FOR PURIFICATION OF CANNABIDIOL WITH HIGH-PERFORMANCE LIQUID CHROMATOGRAPHY | W.R. GRACE & CO.-CONN. (US) | 2024-05-16 | — | — | US | claimed |
| EP-4308291-A1 | STATIONARY PHASE FOR PURIFICATION OF CANNABIDIOL WITH HIGH-PERFORMANCE LIQUID CHROMATOGRAPHY | W. R. Grace & Co.-Conn (US) | 2024-01-24 | — | — | EP | claimed |
| CN-111063690-B | Memory array and method of forming integrated assembly | 美光科技公司 | 2023-10-24 | — | — | CN | claimed |
| US-20230274932-A1 | SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2023-08-31 | — | — | US | claimed |
| WO-2023164685-A1 | SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2023-08-31 | — | — | WO | claimed |
| CN-113345624-B | Insulating coated conductive particles, anisotropic conductive adhesive, and connection structure | 株式会社力森诺科 | 2023-05-12 | — | — | CN | claimed |
| US-11621190-B2 | Method for filling recessed features in semiconductor devices with a low-resistivity metal | TOKYO ELECTRON LIMITED (JP) | 2023-04-04 | — | — | US | claimed |
| US-7468227-B2 | Method of reducing the average process bias during production of a reticle | APPLIED MATERIALS, INC. (US) | 2008-12-23 | — | — | US | claimed |
| US-20060204902-A1 | Method for manufacturing organic electroluminescence display | DAEWOO ELECTRONICS CORPORATION (KR) | 2006-09-14 | — | — | US | claimed |
| WO-2006065065-A1 | METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENCE DISPLAY | DAEWOO ELECTRONICS CORPORATION (KR) | 2006-06-22 | — | — | WO | claimed |
| US-20060105248-A1 | Method of reducing the average process bias during production of a reticle | APPLIED MATERIALS, INC. | 2006-05-18 | — | — | US | claimed |
| US-20030021996-A1 | Release surfaces | GUDIMENKO YURI (CA) | 2003-01-30 | — | — | US | claimed |
| US-5320934-A | Bilayer photolithographic process | MISIUM GEORGE R (US) | 1994-06-14 | — | — | US | claimed |
| EP-0265619-B1 | PLANARIZATION THROUGH SILYLATION | International Business Machines Corporation (US) | 1992-05-13 | — | — | EP | claimed |
| EP-0229917-B1 | A PROCESS FOR GENERATING A POSITIVE TONE PHOTORESIST | International Business Machines Corporation (US) | 1990-07-04 | — | — | EP | claimed |
| EP-0229917-A2 | A process for generating a positive tone photoresist | International Business Machines Corporation (US) | 1987-07-29 | — | — | EP | claimed |
| US-4657845-A | Positive tone oxygen plasma developable photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1987-04-14 | — | — | US | claimed |