SCHEMBL210398

SCHEMBL210398

C[CH]OC(=O)NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2780100 0.77
SCHEMBL8771999 0.74
SCHEMBL19944959 0.72 CHRM2 (0.33)
Bromide SCHEMBL16762436 0.72
SCHEMBL1416366 0.70
SCHEMBL514392 0.70
SCHEMBL1416114 0.70
SCHEMBL11786076 0.67
SCHEMBL17194015 0.67 CHRM1 (0.40)
SCHEMBL10614 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0758341-B1 FACTOR Xa INHIBITORS AVENTIS PHARMA INC (US) 2004-03-24 EP claimed
US-20020173646-A1 Quinazoline derivatives and pharmaceutical compositions containing them ZENECA LIMITED 2002-11-21 US claimed
US-4902707-A Bicyclic pyrazolidinones, compositions and use ELI LILLY AND COMPANY (US) 1990-02-20 US claimed
US-4826992-A MICROBIOCIDE INTERMEDIATES ELI LILLY AND COMPANY (US) 1989-05-02 US claimed
US-4078146-A TREATMENT OF CARDIO-VASCULAR DISORDERS AKTIEBOLAGET HASSLE (SW) 1978-03-07 US claimed
US-11987715-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2024-05-21 US disclosed
US-20240052185-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2024-02-15 US disclosed
US-20230348742-A1 Radiation Curable Ink Jet Composition SEIKO EPSON CORPORATION (JP) 2023-11-02 US disclosed
EP-4269511-A1 RADIATION CURABLE INK JET COMPOSITION Seiko Epson Corporation (JP) 2023-11-01 EP disclosed
US-20230174809-A1 Radiation-Curable Ink Jet Composition And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2023-06-08 US disclosed
US-20210301158-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORPORATION (JP) 2021-09-30 US disclosed
US-20200131381-A1 RADIATION CURABLE INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2020-04-30 US disclosed
EP-0217142-A2 A polyazaheterocyclic compound Yoshitomi Pharmaceutical Industries, Ltd. (JP) 1987-04-08 EP disclosed
EP-0203722-A1 Bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-12-03 EP disclosed
EP-0202794-A1 7-Substituted-2,3-(Dihydro) bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-11-26 EP disclosed
EP-0202047-A1 Pyrazolidinium ylides ELI LILLY AND COMPANY (US) 1986-11-20 EP disclosed
EP-0183848-A1 POLYAZAHETEROCYCLIC DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND PHARMACEUTICAL COMPOSITION Yoshitomi Pharmaceutical Industries, Ltd. (JP) 1986-06-11 EP disclosed
US-4398913-A ALKALINE PASTES CASSELLA AKTIENGESELLSCHAFT (DE) 1983-08-16 US disclosed
US-4065587-A U.V. Curable poly(ether-urethane) polyacrylates and wet-look polymers prepared therefrom SCM CORPORATION (US) 1977-12-27 US disclosed
US-3941791-A OPTICAL BRIGHTENER BASF AKTIENGESELLSCHAFT (DT) 1976-03-02 US disclosed