SCHEMBL2104558

SCHEMBL2104558

CC(C)(C)C[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2020209 0.77 TSHR (0.31)
SCHEMBL7056115 0.69
SCHEMBL25240754 0.69
SCHEMBL9233497 0.67
SCHEMBL2100022 0.67
SCHEMBL12504271 0.67
SCHEMBL4077371 0.67
SCHEMBL2104676 0.65
SCHEMBL7145258 0.64
SCHEMBL17138328 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014170799-A1 CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) 2014-10-23 WO claimed
JP-3072487-A None JP disclosed
JP-60246390-A None JP disclosed
CN-115605530-B Polycarbosilazanes and compositions comprising the same and methods of making silicon-containing films using the same 默克专利有限公司 2024-09-27 CN disclosed
US-11999827-B2 Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same MERCK PATENT GMBH (DE) 2024-06-04 US disclosed
EP-4146725-B1 POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME MERCK PATENT GMBH (DE) 2024-05-22 EP disclosed
EP-3743464-B1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF BRONX CREATIVE&DESIGN CENTRE PTE LTD (SG) 2024-03-06 EP disclosed
US-20230250250-A1 Organic-inorganic Aerogel Composites, Methods and Uses Thereof BRONX CREATIVE & DESIGN CENTRE PTE LTD (SG) 2023-08-10 US disclosed
US-20230174724-A1 POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-06-08 US disclosed
CN-113402554-B PNSiNP ligand and preparation method thereof, ethylene oligomerization catalyst and application thereof 万华化学集团股份有限公司 2023-03-31 CN disclosed
EP-0493367-A2 Silicone resist materials containing polysilanes and methods of making the same KABUSHIKI KAISHA TOSHIBA (JP) 1992-07-01 EP disclosed
WO-1992009615-A1 METHOD AND MEANS FOR OLIGONUCLEOTIDE SYNTHESIS PHARMACIA LKB BIOTECHNOLOGY AB (SE) 1992-06-11 WO disclosed
US-5068386-A PREPARATION OF TERTIARY-HYDROCARBYLSILYL COMPOUNDS DOW CORNING TORAY SILICONE COMPANY, LTD. (JP) 1991-11-26 US disclosed
US-5017453-A Integrated circuits KABUSHIKI KAISHA TOSHIBA (JP) 1991-05-21 US disclosed
JP-H0372487-A 1,3-DI-TERT-BUTYL-1,3-DIMETHYL-1,3-DIALKOXYDISILOXANE SHIN ETSU CHEM CO LTD 1991-03-27 JP disclosed
EP-0405560-A2 Preparation of tertiary-hydrocarbylsilyl compounds Dow Corning Toray Silicone Company, Limited (JP) 1991-01-02 EP disclosed
US-4822716-A FINE PATTERN SEMICONDUCTOR, INTEGRATED CIRCUIT KABUSHIKI KAISHA TOSHIBA (JP) 1989-04-18 US disclosed
EP-0231497-A1 Silicone resist materials containing polysiloxanes KABUSHIKI KAISHA TOSHIBA (JP) 1987-08-12 EP disclosed
JP-S60246390-A T-BUTYLPHENYLMETHYLCHLOROSILANE SHIN ETSU CHEM CO LTD 1985-12-06 JP disclosed
US-4307212-A Curable epoxy resins GENERAL ELECTRIC COMPANY (US) 1981-12-22 US disclosed