SCHEMBL21049233

SCHEMBL21049233

CC=CC(=O)OCc1ccccc1C(=O)Oc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.45
HPGD P15428 2/20 0.45
ALOX15 P16050 2/20 0.45
MAPT P10636 5/20 0.43
KDM4E B2RXH2 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
HCAR2 Q8TDS4 1/20 0.40
LMNA P02545 3/20 0.38
ALDH1A1 P00352 2/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C9 P11712 2/20 0.38
CYP2C19 P33261 2/20 0.38
CYP2D6 P10635 1/20 0.38
MAPK1 P28482 1/20 0.38
CASP3 P42574 1/20 0.38
RAB9A P51151 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
KMT2A Q03164 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28073169 0.84 TP53 (0.47) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL21049232 0.78 TSHR (0.53) HPGDMAPTKDM4ETDP1HCAR2
SCHEMBL17940800 0.77 HPGD (0.46) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL396553 0.76 HSD17B10 (0.59) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL19582197 0.76 KMT2A (0.45) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL574100 0.75 KMT2A (0.50) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL574099 0.75 KMT2A (0.50) HSD17B10HPGDALOX15MAPTKDM4E
SCHEMBL21049236 0.75 SMN1; SMN2 (0.56) MAPTTDP1HCAR2LMNAALDH1A1
SCHEMBL14937098 0.75 MAOB (0.45) MAPTKDM4EHCAR2LMNAALDH1A1
SCHEMBL5176891 0.75 IDO1 (0.46) HCAR2LMNAGSTP1EGFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111491963-B Method for producing (meth) acrylic composition, coating material containing (meth) acrylic composition, and cured body 三菱瓦斯化学株式会社 2023-04-28 CN disclosed
CN-113710750-B (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2022-07-12 CN disclosed
CN-113710750-A (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2021-11-26 CN disclosed
CN-108603953-B Light diffusing agent, light diffusing resin composition, and molded article 三菱瓦斯化学株式会社 2021-08-24 CN disclosed
CN-109790366-B (meth) acrylic copolymer, resin composition, molded article thereof, and method for producing molded article 三菱瓦斯化学株式会社 2021-04-27 CN disclosed
CN-108822245-B (meth) acrylic acid-based copolymer 三菱瓦斯化学株式会社 2021-02-12 CN disclosed
CN-111491963-A Method for producing (meth) acrylic composition, and coating material and cured body containing (meth) acrylic composition 三菱瓦斯化学株式会社 2020-08-04 CN disclosed
US-20190338157-A1 (METH)ACRYLIC COMPOSITION, COATING MATERIAL CONTAINING SAME AND CURED BODY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-11-07 US disclosed
EP-3495397-A1 (METH)ACRYLIC COMPOSITION, COATING MATERIAL CONTAINING SAME AND CURED BODY Mitsubishi Gas Chemical Company, Inc. (JP) 2019-06-12 EP disclosed
CN-107406654-B Resin composition and molded article using same 三菱瓦斯化学株式会社 2019-03-08 CN disclosed
CN-108603953-A Light diffusing agent, light-diffusing resin composition and formed body 三菱瓦斯化学株式会社 2018-09-28 CN disclosed
CN-107406654-A Resin composition and molded article using same 三菱瓦斯化学株式会社 2017-11-28 CN disclosed