SCHEMBL21049236

SCHEMBL21049236

CC=CC(=O)OCc1cccc(C(=O)Oc2ccccc2)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.56
MAPT P10636 3/20 0.50
HCAR2 Q8TDS4 4/20 0.47
EGFR P00533 1/20 0.46
JAK3 P52333 1/20 0.46
BTK Q06187 1/20 0.46
TDP1 Q9NUW8 2/20 0.45
LMNA P02545 1/20 0.45
RAB9A P51151 2/20 0.43
SLC6A2 P23975 1/20 0.43
SLC6A3 Q01959 1/20 0.43
KMT2A Q03164 1/20 0.43
MRGPRX4 Q96LA9 3/20 0.43
NPC1 O15118 1/20 0.42
ALDH1A1 P00352 1/20 0.42
MAOB P27338 1/20 0.42
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
CA12 O43570 1/20 0.42
AKR1B10 O60218 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21049232 0.86 TSHR (0.53) SMN1; SMN2MAPTHCAR2EGFRBTK
SCHEMBL28073168 0.84 MRGPRX4 (0.52) SMN1; SMN2HCAR2EGFRJAK3BTK
Benzoic Acid SCHEMBL28244406 0.80 HCAR2 (0.49) HCAR2EGFRJAK3BTKLMNA
SCHEMBL1070426 0.79 HCAR2 (0.71) HCAR2EGFRJAK3BTKTDP1
SCHEMBL1070423 0.79 HCAR2 (0.71) HCAR2EGFRJAK3BTKTDP1
SCHEMBL28167053 0.79 MMP1 (0.53) MAPTHCAR2RAB9AMRGPRX4NPC1
SCHEMBL17940788 0.79 SMN1; SMN2 (0.57) SMN1; SMN2MAPTTDP1RAB9ASLC6A2
SCHEMBL10778415 0.78 MAPT (0.56) SMN1; SMN2MAPTTDP1KMT2AALDH1A1
SCHEMBL6671241 0.76 KMT2A (0.63) SMN1; SMN2MAPTTDP1LMNARAB9A
SCHEMBL12129556 0.76 SMN1; SMN2 (0.56) SMN1; SMN2MAPTTDP1MRGPRX4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111491963-B Method for producing (meth) acrylic composition, coating material containing (meth) acrylic composition, and cured body 三菱瓦斯化学株式会社 2023-04-28 CN disclosed
CN-113710750-B (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2022-07-12 CN disclosed
CN-113710750-A (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2021-11-26 CN disclosed
CN-108603953-B Light diffusing agent, light diffusing resin composition, and molded article 三菱瓦斯化学株式会社 2021-08-24 CN disclosed
CN-109790366-B (meth) acrylic copolymer, resin composition, molded article thereof, and method for producing molded article 三菱瓦斯化学株式会社 2021-04-27 CN disclosed
CN-108822245-B (meth) acrylic acid-based copolymer 三菱瓦斯化学株式会社 2021-02-12 CN disclosed
WO-2020218151-A1 (METH)ACRYLIC COMPOSITION, PAINT AND CURING AGENT COMPRISING SAME 三菱瓦斯化学株式会社 2020-10-29 WO disclosed
CN-111491963-A Method for producing (meth) acrylic composition, and coating material and cured body containing (meth) acrylic composition 三菱瓦斯化学株式会社 2020-08-04 CN disclosed
US-20190338157-A1 (METH)ACRYLIC COMPOSITION, COATING MATERIAL CONTAINING SAME AND CURED BODY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-11-07 US disclosed
EP-3495397-A1 (METH)ACRYLIC COMPOSITION, COATING MATERIAL CONTAINING SAME AND CURED BODY Mitsubishi Gas Chemical Company, Inc. (JP) 2019-06-12 EP disclosed
CN-107406654-B Resin composition and molded article using same 三菱瓦斯化学株式会社 2019-03-08 CN disclosed
CN-108603953-A Light diffusing agent, light-diffusing resin composition and formed body 三菱瓦斯化学株式会社 2018-09-28 CN disclosed
CN-107406654-A Resin composition and molded article using same 三菱瓦斯化学株式会社 2017-11-28 CN disclosed