⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21066079 | 0.98 | — | — | |
| SCHEMBL21101828 | 0.98 | — | — | |
| SCHEMBL21066080 | 0.95 | — | — | |
| SCHEMBL21066099 | 0.95 | — | — | |
| SCHEMBL21066081 | 0.85 | — | — | |
| SCHEMBL6661239 | 0.82 | KDM4E (0.34) | — | |
| SCHEMBL18031714 | 0.82 | — | — | |
| SCHEMBL2719986 | 0.77 | KDM4E (0.32) | — | |
| SCHEMBL14286668 | 0.75 | — | — | |
| SCHEMBL15235662 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10919918-B2 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| US-20190169211-A1 | NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-06 | — | — | US | disclosed |