SCHEMBL21066530

SCHEMBL21066530

Cc1ccc(O)c2ccc(O)c(C)c12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR2 Q92731 15/20 0.50
▸ ESR1 P03372 13/20 0.50
▸ APP P05067 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ THRB P10828 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ ALOX15 P16050 1/20 0.41
▸ TSHR P16473 1/20 0.41
▸ CASP1 P29466 1/20 0.41
▸ SNCA P37840 1/20 0.41
▸ RECQL P46063 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ TRPA1 O75762 1/20 0.41
▸ ATM Q13315 1/20 0.41
▸ OPRK1 P41145 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ MAOB P27338 1/20 0.40
▸ HSD17B1 P14061 1/20 0.36
▸ HSD17B2 P37059 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29771851 1.00 ESR2 (0.50) ESR2ESR1APPMAPTTHRB
SCHEMBL21066518 0.81 ESR2 (0.46) ESR2ESR1HPGDTSHRHSD17B10
SCHEMBL29771832 0.81 ESR2 (0.46) ESR2ESR1HPGDTSHRHSD17B10
SCHEMBL11667928 0.76 APP (0.58) ESR2ESR1APPMAPTTHRB
SCHEMBL19012038 0.75 ESR2 (0.47) ESR2ESR1APPMAPTTHRB
SCHEMBL12401850 0.74 TDP1 (0.61) ESR2ESR1APPMAPTTHRB
SCHEMBL14998896 0.74 MAPT (0.70) ESR2ESR1APPMAPTTHRB
SCHEMBL29771840 0.74 MAPT (0.70) ESR2ESR1APPMAPTTHRB
SCHEMBL9623486 0.73 ESR2 (0.50) ESR2ESR1THRBHPGDCASP1
SCHEMBL15586477 0.73 PIM1 (0.50) ESR2ESR1APPMAPTTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109960111-B Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern 信越化学工业株式会社 2022-07-12 — — CN disclosed
US-11018015-B2 Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-25 — — US disclosed
EP-3508918-B1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-07-15 — — EP disclosed
EP-3508918-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2019-07-10 — — EP disclosed
CN-109960111-A Organic film forms the forming method and pattern forming method with composition, semiconductor device producing substrate, organic film 信越化学工业株式会社 2019-07-02 — — CN disclosed
US-20190198341-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-06-27 — — US disclosed
Send feedback