Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 9/20 | 0.50 |
| ▸ | ESR1 | P03372 | 8/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | IDO1 | P14902 | 1/20 | 0.40 |
| ▸ | THRA | P10827 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29771854 | 1.00 | ESR2 (0.50) | ESR2ESR1TRPA1ATMMAOB | |
| SCHEMBL4188624 | 0.84 | IDO1 (0.55) | ESR2ESR1TRPA1ATMKDM4E | |
| SCHEMBL3961404 | 0.83 | CYP1A2 (0.59) | ESR2ESR1TRPA1ATMMAOB | |
| SCHEMBL68013 | 0.82 | TRPA1 (0.53) | ESR2ESR1TRPA1ATMKDM4E | |
| SCHEMBL29457565 | 0.82 | TRPA1 (0.53) | ESR2ESR1TRPA1ATMKDM4E | |
| SCHEMBL28713460 | 0.81 | ESR2 (0.57) | ESR2ESR1MAOBKDM4EALDH1A1 | |
| SCHEMBL14641012 | 0.79 | LDHA (0.49) | ESR2ESR1MAOBKDM4EALDH1A1 | |
| SCHEMBL11140356 | 0.79 | TRPA1 (0.41) | ESR2ESR1TRPA1ATMKDM4E | |
| SCHEMBL18318914 | 0.79 | CYP2A6 (0.41) | ESR2ESR1MAOBKDM4EALDH1A1 | |
| SCHEMBL19012038 | 0.77 | ESR2 (0.47) | ESR2ESR1TRPA1ATMMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109960111-B | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| US-20220011672-A1 | COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING RESIST UNDERLAYER FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11018015-B2 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-25 | — | — | US | disclosed |
| US-10799496-B2 | Naphthylenyl compounds for long-acting injectable compositions and related methods | ALKERMES PHARMA IRELAND LIMITED (IE) | 2020-10-13 | — | — | US | disclosed |
| US-10799496-B2 | Naphthylenyl compounds for long-acting injectable compositions and related methods | ALKERMES PHARMA IRELAND LIMITED (IE) | 2020-10-13 | — | — | US | disclosed |
| EP-3508918-B1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-15 | — | — | EP | disclosed |
| WO-2020012248-A1 | NOVEL NAPHTHYLENYL COMPOUNDS FOR LONG-ACTING INJECTABLE COMPOSITIONS AND RELATED METHODS | ALKERMES PHARMA IRELAND LIMITED (IE) | 2020-01-16 | — | — | WO | disclosed |
| WO-2020012248-A1 | NOVEL NAPHTHYLENYL COMPOUNDS FOR LONG-ACTING INJECTABLE COMPOSITIONS AND RELATED METHODS | ALKERMES PHARMA IRELAND LIMITED (IE) | 2020-01-16 | — | — | WO | disclosed |
| EP-3508918-A1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-07-10 | — | — | EP | disclosed |
| CN-109960111-A | Organic film forms the forming method and pattern forming method with composition, semiconductor device producing substrate, organic film | 信越化学工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| US-20190198341-A1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| EP-0212944-B1 | MELT-PROCESSABLE AROMATIC COPOLYESTER | Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) | 1992-04-08 | — | — | EP | disclosed |
| EP-0298692-A2 | Melt processable polyester capable of forming an anisotropic melt comprising a relatively low concentration of 6-oxy-2-naphthoyi moiety, 4-oxy-benzoyl moiety, 2,6-dioxynaphthalene moiety, and terephthaloyl moiety | HOECHST CELANESE CORPORATION (US) | 1989-01-11 | — | — | EP | disclosed |
| US-4746721-A | ENGINEERING PLASTICS | KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) | 1988-05-24 | — | — | US | disclosed |
| US-4746694-A | Melt processable polyester capable of forming an anisotropic melt comprising a relatively low concentration of 6-oxy-2-naphthoyl moiety, 4-oxybenzoyl moiety, 2,6-dioxynaphthalene moiety, and terephthaloyl moiety | HOECHST CELANESE CORPORATION (US) | 1988-05-24 | — | — | US | disclosed |
| EP-0212944-A2 | Melt-processable aromatic copolyester | Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) | 1987-03-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10799496-B2 | Naphthylenyl compounds for long-acting injectable compositions and related methods | OPRL1, OPRK1, OPRM1 | ESR2 1365/4885ESR1 1538/4885TRPA1 4053/4885 |
| US-20220011672-A1 | COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING RESIST UNDERLAYER FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND | TOP1, RER1, ABCC1 | ESR2 1671/4885ESR1 1655/4885TRPA1 4120/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.