⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL669682 | 0.78 | — | — | |
| Iodide SCHEMBL5574541 | 0.76 | — | — | |
| SCHEMBL3132706 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL11752579 | 0.72 | — | — | |
| SCHEMBL529707 | 0.71 | CYP2D6 (0.32) | — | |
| SCHEMBL6562544 | 0.70 | ALDH1A1 (0.35) | — | |
| Hydrochloric Acid SCHEMBL11351741 | 0.69 | — | — | |
| SCHEMBL5246444 | 0.69 | — | — | |
| SCHEMBL7878694 | 0.69 | — | — | |
| SCHEMBL194057 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7550020-B2 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | JSR CORPORATION (JP) | 2009-06-23 | — | — | US | claimed |
| EP-1077240-B1 | Aqueous dispersion for chemical mechanical polishing | JSR CORP (JP) | 2006-11-08 | — | — | EP | claimed |
| EP-2098545-B1 | COMPOSITION FOR OIL-RESISTANT WEATHER-RESISTANT RUBBER, AND RUBBER MOLDED BODY | JSR CORP (JP) | 2012-10-10 | — | — | EP | disclosed |
| US-8157877-B2 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-2098545-A1 | METHOD FOR PRODUCING POLYMER FOR OIL-RESISTANT RUBBER, POLYMER FOR OIL-RESISTANT RUBBER, COMPOSITION FOR OIL-RESISTANT WEATHER-RESISTANT RUBBER, AND RUBBER MOLDED BODY | JSR Corporation (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-20090165395-A1 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION | JSR CORPORATION (JP) | 2009-07-02 | — | — | US | disclosed |
| US-7550020-B2 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | JSR CORPORATION (JP) | 2009-06-23 | — | — | US | disclosed |
| EP-1962334-A1 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING | JSR Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| EP-1616927-B1 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | JSR CORP (JP) | 2007-09-12 | — | — | EP | disclosed |
| US-7153369-B2 | Method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| EP-1108743-B1 | Separation of viruses and detection of viruses | JSR CORP (JP) | 2006-11-15 | — | — | EP | disclosed |
| US-20020068805-A1 | Hollow crosslinked cationic polymer particles, method of producing said particles, and paint composition, cationic electrodeposition paint composition, resin composition, filled paper, paper coating composition, and coated paper | JSR CORPORATION (JP) | 2002-06-06 | — | — | US | disclosed |
| US-20010009759-A1 | Virus-binding particles, virus-separating reagent, separation of viruses, and detection of viruses | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1108743-A2 | Virus-binding particles, virus-separating reagent, separation of viruses, and detection of viruses | JSR Corporation (JP) | 2001-06-20 | — | — | EP | disclosed |
| EP-1077240-A1 | Aqueous dispersion for chemical mechanical polishing | JSR Corporation (JP) | 2001-02-21 | — | — | EP | disclosed |
| US-6169152-B1 | COPOLYMER OF ETHYLENE AND A POLAR GROUP-CONTAINING CYCLIC OLEFIN COMPRISING ESTER- OR ANHYDRIDE MODIFIED NORBORNENE OR PERHYDRO-2,3-DIDEHYDRO-1,4:5,8-DIMETHANONAPHTHALENE MADE WITH CATALYST SUCH AS 1,5,9-TRIAZACYCLODODECANYLTITANIUM CHLORIDE | JSR CORPORATION (JP) | 2001-01-02 | — | — | US | disclosed |
| EP-0864927-B1 | Water-developable photosensitive resin composition | JSR CORP (JP) | 2000-12-27 | — | — | EP | disclosed |
| US-6140017-A | LIGHT SENSITIVE POLYMERS FROM ALIPHATIC CONJUGATED DIENES WITH UNSATURATED MONOMER AND BLOCK COPOLYMERS WITH SULFONATE GROUPS PARTICULATE COPOLYMER (1) HAS AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF CARBOXYL | JSR CORPORATION (JP) | 2000-10-31 | — | — | US | disclosed |
| EP-0864927-A1 | Water-developable photosensitive resin composition | JSR Corporation (JP) | 1998-09-16 | — | — | EP | disclosed |
| EP-0816387-A1 | Olefin-polymerizing catalyst | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-01-07 | — | — | EP | disclosed |