Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.34 |
| ▸ | TDO2 | P48775 | 1/20 | 0.34 |
| ▸ | GBA1 | P04062 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 7/20 | 0.30 |
| ▸ | PTGS2 | P35354 | 6/20 | 0.30 |
| ▸ | MT-CO1 | P00395 | 1/20 | 0.30 |
| ▸ | MT-CO2 | P00403 | 1/20 | 0.30 |
| ▸ | SHBG | P04278 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12462658 | 0.82 | PABPC1 (0.37) | CA1CA2CA4GBA1PTGS1 | |
| SCHEMBL14639770 | 0.82 | CA1 (0.40) | CA1CA2CA4IDO1TDO2 | |
| SCHEMBL19906495 | 0.81 | CA1 (0.38) | CA1CA2CA4IDO1TDO2 | |
| SCHEMBL16191651 | 0.81 | CA1 (0.38) | CA1CA2CA4IDO1TDO2 | |
| SCHEMBL3479985 | 0.81 | GBA1 (0.38) | CA1CA2CA4IDO1TDO2 | |
| SCHEMBL23797124 | 0.77 | CA1 (0.35) | CA1CA2CA4SHBG | |
| SCHEMBL19464310 | 0.77 | CA1 (0.35) | CA1CA2CA4SHBG | |
| SCHEMBL14781411 | 0.77 | CA1 (0.35) | CA1CA2CA4SHBG | |
| SCHEMBL349547 | 0.77 | GBA1 (0.42) | CA1CA2CA4GBA1 | |
| SCHEMBL5663911 | 0.76 | CA1 (0.33) | CA1CA2CA4IDO1TDO2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3537217-A2 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM Corporation (JP) | 2019-09-11 | — | — | EP | disclosed |
| EP-1795960-B1 | Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition | FUJIFILM CORP (JP) | 2019-06-05 | — | — | EP | disclosed |