Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 6/20 | 0.50 |
| ▸ | CASP2 | P42575 | 1/20 | 0.47 |
| ▸ | FAAH | O00519 | 5/20 | 0.46 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.44 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.44 |
| ▸ | NAAA | Q02083 | 1/20 | 0.44 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.43 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.43 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.43 |
| ▸ | CES2 | O00748 | 3/20 | 0.41 |
| ▸ | CES1 | P23141 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19336122 | 1.00 | EPHX1 (0.50) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL22447142 | 1.00 | EPHX1 (0.50) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL19176981 | 1.00 | EPHX1 (0.50) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL18965287 | 0.95 | EPHX1 (0.52) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL27345705 | 0.95 | EPHX1 (0.52) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL24041036 | 0.95 | EPHX1 (0.52) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL21527587 | 0.95 | EPHX1 (0.52) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL20903683 | 0.95 | EPHX1 (0.52) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL24238536 | 0.95 | EPHX1 (0.43) | EPHX1CASP2FAAHZDHHC20ZDHHC2 | |
| SCHEMBL23394747 | 0.93 | CASP2 (0.48) | EPHX1CASP2FAAHZDHHC20ZDHHC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681223-B2 | Photocurable composition and method for producing semiconductor device | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20200225584-A1 | ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2020-07-16 | — | — | US | disclosed |
| US-20190171101-A1 | PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | NISSAN CHEMICAL CORPORATION (JP) | 2019-06-06 | — | — | US | disclosed |