SCHEMBL2114303

SCHEMBL2114303

CC(=O)OCc1cc(C)cc(COC(C)=O)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
HSD17B10 Q99714 3/20 0.45
KDM4E B2RXH2 2/20 0.45
CYP3A4 P08684 3/20 0.41
AMY1A P0DUB6 1/20 0.40
LMNA P02545 3/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
HSPA5 P11021 1/20 0.36
NR1H2 P55055 1/20 0.36
NR1H3 Q13133 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13140675 0.93 HSD17B10 (0.41) ALDH1A1HSD17B10KDM4ECYP3A4AMY1A
SCHEMBL28499090 0.87 TNKS2 (0.46) ALDH1A1HSD17B10KDM4ECYP3A4AMY1A
SCHEMBL19886563 0.86 KDM4E (0.37) ALDH1A1HSD17B10KDM4ECYP3A4AMY1A
SCHEMBL7566203 0.84 ALDH1A1 (0.52) ALDH1A1HSD17B10KDM4ECYP3A4LMNA
SCHEMBL18285025 0.83 CYP2C19 (0.40) ALDH1A1HSD17B10KDM4ELMNASMN1; SMN2
SCHEMBL16317657 0.82 ALDH1A1 (0.37) ALDH1A1HSD17B10KDM4ECYP3A4SMN1; SMN2
SCHEMBL9578035 0.82 ALDH1A1 (0.38) ALDH1A1HSD17B10KDM4ECYP3A4AMY1A
SCHEMBL1466758 0.81 KDM4E (0.54) ALDH1A1HSD17B10KDM4ECYP3A4LMNA
Acetic Acid SCHEMBL9331113 0.81 ALDH1A1 (0.53) ALDH1A1HSD17B10KDM4ECYP3A4CA2
SCHEMBL9331500 0.81 HSD17B10 (0.47) ALDH1A1HSD17B10KDM4ECYP3A4LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 432 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120143554-A Positive photosensitive resin composition 万华化学集团股份有限公司 2025-06-13 CN claimed
CN-117806123-B Chemical amplification type negative photosensitive polyimide composition and application thereof 明士(北京)新材料开发有限公司 2024-05-31 CN claimed
CN-117806123-A Chemical amplification type negative photosensitive polyimide composition and application thereof 明士(北京)新材料开发有限公司 2024-04-02 CN claimed
CN-115561966-B Chemical amplification type negative photosensitive polyimide coating adhesive and application thereof 明士(北京)新材料开发有限公司 2023-05-16 CN claimed
CN-115561966-A Chemical amplification type negative photosensitive polyimide coating adhesive and application 明士(北京)新材料开发有限公司 2023-01-03 CN claimed
CN-114874441-A Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof 明士(北京)新材料开发有限公司 2022-08-09 CN claimed
CN-114488690-A Chemical amplification type negative polyimide photoresist and preparation method and application thereof 中国科学院化学研究所 2022-05-13 CN claimed
CN-111522200-B Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2021-07-27 CN claimed
CN-111522200-A Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2020-08-11 CN claimed
EP-0543762-B1 Dry developable photoresist compositions and method for use thereof IBM (US) 2000-02-16 EP claimed
US-5340888-A Curable mixture of phenolic novolak resin, esterified phenolic compound and base; for foundry molds, cores BORDEN INC. (US) 1994-08-23 US claimed
US-5322765-A Dry developable photoresist compositions and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
US-5296332-A Crosslinkable aqueous developable photoresist compositions and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-22 US claimed
EP-0377308-B1 Phenolic resins BORDEN UK LTD (GB) 1993-11-03 EP claimed
EP-0543761-A1 Crosslinkable aqueous developable photoresist compositions and method for use thereof International Business Machines Corporation (US) 1993-05-26 EP claimed
US-5051454-A An esterified phenolic compound, an unesterified phenolic resole and a base and curing BORDEN, INC. (US) 1991-09-24 US claimed
EP-0377308-A1 Phenolic resins BORDEN (UK) LIMITED (GB) 1990-07-11 EP claimed
WO-1990006904-A2 PHENOLIC RESINS BORDEN (UK) LIMITED (GB) 1990-06-28 WO claimed
CN-122055676-A Resin composition, cured product, display device, or semiconductor device 东丽株式会社 2026-05-15 CN disclosed
US-5096983-A Magnesium oxide and and ester as hardeners, retarder to inhibit hardening BORDEN, INC. (US) 1992-03-17 US disclosed