Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14509344 | 0.80 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL22361187 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL14509373 | 0.80 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL24813050 | 0.77 | ALDH1A1 (0.37) | ALDH1A1TSHRTHRB | |
| SCHEMBL16823220 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL7717525 | 0.74 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB | |
| SCHEMBL9558557 | 0.74 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRB | |
| SCHEMBL17300339 | 0.73 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL1562475 | 0.73 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB | |
| SCHEMBL10495124 | 0.71 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109791359-B | Resist composition, method for forming resist pattern, polymer compound and copolymer | 东京应化工业株式会社 | 2022-10-11 | — | — | CN | disclosed |
| US-20190219920-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-18 | — | — | US | disclosed |
| US-20190219920-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-18 | — | — | US | disclosed |