Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 1/20 | 0.49 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.49 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.49 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.49 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.48 |
| ▸ | CA7 | P43166 | 1/20 | 0.48 |
| ▸ | CA9 | Q16790 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.47 |
| ▸ | MEN1 | O00255 | 4/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27818080 | 0.84 | CYP1A2 (0.69) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL24116337 | 0.79 | KMT2A (0.53) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL6340507 | 0.77 | CA12 (0.54) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL11050089 | 0.76 | NR4A1 (0.56) | GRIN2DGRIN2AGRIN2BGRIN2CKMT2A | |
| SCHEMBL7911783 | 0.76 | ALDH1A1 (0.65) | GRIN2DGRIN2AGRIN2BGRIN2CCA1 | |
| SCHEMBL24116593 | 0.75 | KMT2A (0.59) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL9350261 | 0.75 | MEN1 (0.50) | GRIN2DGRIN2AGRIN2BGRIN2CKMT2A | |
| SCHEMBL3392195 | 0.74 | CA12 (0.61) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL24116589 | 0.73 | CA12 (0.54) | GRIN2DGRIN2AGRIN2BGRIN2CCA12 | |
| SCHEMBL14917525 | 0.72 | DHODH (0.53) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158568-B2 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-20100248477-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith | YOKOI SHIGERU | 2010-09-30 | — | — | US | disclosed |
| CN-1849386-B | Cleaning composition, method for cleaning semiconductor substrate, and method for forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO LTD INTEL | 2010-07-28 | — | — | CN | disclosed |
| US-20100051582-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2010-03-04 | — | — | US | disclosed |
| CN-100504620-C | Etching solution for forming bimetallic mosaic structure and base plate treatment method | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2009-06-24 | — | — | CN | disclosed |
| US-20090156005-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2009-06-18 | — | — | US | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20060241012-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2006-10-26 | — | — | US | disclosed |
| CN-1849386-A | Cleaning composition, method for cleaning semiconductor substrate, and method for forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO LTD INTEL (JP) | 2006-10-18 | — | — | CN | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| CN-1495535-A | Etching solution for forming bimetallic mosaic structure craft and base phate treatment method | ͬ�Ϳ�ҵ��ʽ���� | 2004-05-12 | — | — | CN | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |