Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2118609 | 0.83 | MAPT (0.44) | MAPTKMT2AATM | |
| SCHEMBL9135241 | 0.80 | MAPT (0.51) | MAPT | |
| SCHEMBL2114163 | 0.79 | MAPT (0.34) | MAPT | |
| SCHEMBL2117150 | 0.78 | ASIC3 (0.41) | MAPTKMT2AATM | |
| Phenylacetylene SCHEMBL9135009 | 0.73 | MAPT (0.45) | MAPT | |
| SCHEMBL5958205 | 0.73 | HRH3 (0.38) | MAPTKMT2AATM | |
| SCHEMBL2116025 | 0.69 | — | — | |
| SCHEMBL5958140 | 0.69 | NPSR1 (0.39) | — | |
| SCHEMBL11883827 | 0.68 | APP (0.44) | MAPT | |
| SCHEMBL11546576 | 0.68 | MAPT (0.47) | MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2555053-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-18 | — | — | EP | disclosed |
| EP-2555053-A1 | Positive-type photosensitive resin composition | Toray Industries, Inc. (JP) | 2013-02-06 | — | — | EP | disclosed |
| EP-2110708-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2012-12-05 | — | — | EP | disclosed |
| CN-101611350-B | Positive-type photosensitive resin composition | TORAY IND JP | 2012-08-08 | — | — | CN | disclosed |
| US-8158324-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| CN-101611350-A | Positive type photosensitive organic compound | TORAY INDUSTRIES (JP) | 2009-12-23 | — | — | CN | disclosed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | disclosed |