Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.50 |
| ▸ | LCK | P06239 | 5/20 | 0.43 |
| ▸ | CDC42 | P60953 | 4/20 | 0.41 |
| ▸ | RAC1 | P63000 | 4/20 | 0.41 |
| ▸ | ACHE | P22303 | 2/20 | 0.37 |
| ▸ | ST14 | Q9Y5Y6 | 1/20 | 0.36 |
| ▸ | EGFR | P00533 | 2/20 | 0.36 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | PRKCG | P05129 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | PRKCB | P05771 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30662390 | 0.92 | PTPN22 (0.52) | PTPN22LCKCDC42RAC1ACHE | |
| SCHEMBL25390886 | 0.92 | PTPN22 (0.52) | PTPN22LCKCDC42RAC1ACHE | |
| SCHEMBL18068463 | 0.92 | PTPN22 (0.56) | PTPN22LCKCDC42RAC1ACHE | |
| SCHEMBL15257812 | 0.90 | PTPN22 (0.54) | PTPN22LCKCDC42RAC1ACHE | |
| SCHEMBL7793886 | 0.82 | CDC42 (0.55) | PTPN22LCKCDC42RAC1ACHE | |
| SCHEMBL25429187 | 0.81 | PTPN22 (0.64) | PTPN22LCKEGFRTRPM4KDM4E | |
| SCHEMBL82870 | 0.81 | PTPN22 (0.64) | PTPN22LCKEGFRTRPM4KDM4E | |
| SCHEMBL29447273 | 0.81 | PTPN22 (0.64) | PTPN22LCKEGFRTRPM4KDM4E | |
| SCHEMBL28752695 | 0.79 | PTPN22 (0.61) | PTPN22LCKEGFRTRPM4KDM4E | |
| SCHEMBL9430385 | 0.79 | PTPN22 (0.61) | PTPN22LCKEGFRTRPM4KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6544717-B2 | Antireflective coating | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-04-08 | — | — | US | claimed |
| US-20010018163-A1 | Undercoating composition for photolithographic resist | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-08-30 | — | — | US | claimed |
| US-8158568-B2 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-20100248477-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith | YOKOI SHIGERU | 2010-09-30 | — | — | US | disclosed |
| CN-1849386-B | Cleaning composition, method for cleaning semiconductor substrate, and method for forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO LTD INTEL | 2010-07-28 | — | — | CN | disclosed |
| US-20100051582-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2010-03-04 | — | — | US | disclosed |
| CN-100504620-C | Etching solution for forming bimetallic mosaic structure and base plate treatment method | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2009-06-24 | — | — | CN | disclosed |
| US-20090156005-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2009-06-18 | — | — | US | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20060241012-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2006-10-26 | — | — | US | disclosed |
| US-6544717-B2 | Antireflective coating | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-04-08 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20020077426-A1 | Protective coating composition for dual damascene process | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020055064-A1 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-09 | — | — | US | disclosed |
| US-20010049072-A1 | Undercoating composition for photolithographic resist | HIROSAKI TAKAKO (JP) | 2001-12-06 | — | — | US | disclosed |
| US-20010044080-A1 | Method for forming a finely patterned photoresist layer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| US-6284428-B1 | FOR FORMING OF ANTIREFLECTION UNDERCOATING LAYER TO INTERVENE BETWEEN SURFACE OF SUBSTRATE AND PHOTORESIST LAYER TO BE PATTERNED IN MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICES | TOKYO OHKA KOGYO CO., LTD, (JP) | 2001-09-04 | — | — | US | disclosed |
| US-20010018163-A1 | Undercoating composition for photolithographic resist | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |