SCHEMBL21146862

SCHEMBL21146862

COCCOCCOCCOCCNCCO

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
KDM4E B2RXH2 5/20 0.44
RECQL P46063 1/20 0.44
L3MBTL1 Q9Y468 2/20 0.41
ALDH1A1 P00352 7/20 0.40
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
CYP1A2 P05177 1/20 0.37
POLB P06746 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C19 P33261 1/20 0.37
TDP1 Q9NUW8 1/20 0.36
HSD17B10 Q99714 1/20 0.35
NPC1 O15118 1/20 0.34
TP53 P04637 1/20 0.33
ALOX15 P16050 1/20 0.33
MAPK1 P28482 1/20 0.33
ADRB2 P07550 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15965454 1.00 TSHR (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL18306252 1.00 TSHR (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL15965445 0.91 MEN1 (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL15965476 0.91 MEN1 (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL15965455 0.91 MEN1 (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL15033000 0.91 MEN1 (0.50) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL3570047 0.88 KDM4E (0.52) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL1507545 0.88 KDM4E (0.52) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL30062272 0.88 KDM4E (0.52) TSHRKDM4ERECQLL3MBTL1ALDH1A1
SCHEMBL6686436 0.88 KDM4E (0.52) TSHRKDM4ERECQLL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4306558-A1 BIOELECTRODE, PRODUCTION METHOD FOR BIOELECTRODE, AND MEASUREMENT METHOD FOR BIOSIGNALS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-17 EP disclosed
WO-2023095561-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2023-06-01 WO disclosed
WO-2023095563-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2023-06-01 WO disclosed
EP-3848756-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2022-07-06 EP disclosed
EP-3848756-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-07-14 EP disclosed
WO-2021039391-A1 ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-03-04 WO disclosed
EP-3783434-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-02-24 EP disclosed
EP-3508917-A1 ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD FUJIFILM Corporation (JP) 2019-07-10 EP disclosed