SCHEMBL21147092

SCHEMBL21147092

NCc1cccc(CCN2C(=O)c3ccccc3C2=O)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CASP3 P42574 1/20 0.59
▸ ALDH1A1 P00352 4/20 0.56
▸ MAPT P10636 3/20 0.56
▸ RAB9A P51151 3/20 0.56
▸ GAA P10253 2/20 0.56
▸ KDM4E B2RXH2 1/20 0.56
▸ SMN1; SMN2 Q16637 1/20 0.56
▸ CA1 P00915 2/20 0.54
▸ CA2 P00918 2/20 0.54
▸ CA9 Q16790 2/20 0.54
▸ CA4 P22748 1/20 0.54
▸ TDP1 Q9NUW8 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.51
▸ CYP1B1 Q16678 1/20 0.49
▸ HSD17B10 Q99714 2/20 0.47
▸ KMT2A Q03164 2/20 0.47
▸ APAF1 O14727 1/20 0.47
▸ CASP1 P29466 1/20 0.47
▸ BLM P54132 1/20 0.47
▸ CASP7 P55210 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21997414 0.88 CA1 (0.67) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL10488508 0.84 CASP3 (0.59) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL1940988 0.84 CASP3 (0.59) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL12446487 0.83 KMT2A (0.60) CASP3ALDH1A1MAPTGAAKDM4E
Hydrochloric Acid SCHEMBL31609073 0.82 KMT2A (0.59) CASP3ALDH1A1MAPTGAAKDM4E
SCHEMBL1142116 0.81 CASP3 (0.86) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL29724090 0.81 CASP3 (0.86) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL1128881 0.81 CYP1B1 (0.59) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL7886506 0.81 NR1H3 (0.62) CASP3ALDH1A1MAPTRAB9AGAA
SCHEMBL7954623 0.81 CASP3 (0.59) CASP3ALDH1A1MAPTRAB9AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019134824-A1 CURING AGENTS FOR EPOXY RESINS WITH LOW TENDENCY TO THE FORMATION OF CARBAMATES BASF SE (DE) 2019-07-11 — — WO disclosed
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