SCHEMBL21152180

SCHEMBL21152180

c1ccc(SC2CCC(C3CCCCC3)CC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 4/20 0.46
MAOB P27338 4/20 0.46
CARM1 Q86X55 1/20 0.41
PRMT6 Q96LA8 1/20 0.41
F2 P00734 2/20 0.37
PRSS1 P07477 2/20 0.37
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
KMT2A Q03164 1/20 0.36
PTGIR P43119 1/20 0.36
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
ALDH1A1 P00352 3/20 0.33
MAPT P10636 2/20 0.33
HPGD P15428 2/20 0.33
PKM P14618 1/20 0.33
ALOX15 P16050 1/20 0.33
ALOX12 P18054 1/20 0.33
MC4R P32245 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15270965 0.87 MAOA (0.57) MAOAMAOBCARM1PRMT6F2
SCHEMBL576211 0.87 MAOA (0.57) MAOAMAOBCARM1PRMT6F2
SCHEMBL576029 0.85 MAOA (0.53) MAOAMAOBCARM1PRMT6F2
SCHEMBL12110641 0.85 CARM1 (0.50) MAOAMAOBCARM1PRMT6F2
SCHEMBL102816 0.85 CARM1 (0.50) MAOAMAOBCARM1PRMT6F2
SCHEMBL4696488 0.81 MAOA (0.48) MAOAMAOBCARM1PRMT6F2
SCHEMBL16727308 0.80 MAOA (0.55) MAOAMAOBCARM1PRMT6F2
Hydroquinone SCHEMBL27620492 0.78 MAOA (0.49) MAOAMAOBCARM1PRMT6F2
Fluoride SCHEMBL9841703 0.77 CARM1 (0.43) MAOAMAOBCARM1PRMT6DDB1
SCHEMBL13844911 0.76 MAOA (0.55) MAOAMAOBCARM1PRMT6NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3106920-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-07-10 EP disclosed