SCHEMBL2115255

SCHEMBL2115255

C=COCCOC(C)(C)OC(C)CCC(=C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2115694 0.82 TET2 (0.32)
SCHEMBL2112944 0.80 ALOX15 (0.30)
SCHEMBL2113358 0.79 TET2 (0.32)
SCHEMBL2289134 0.77
SCHEMBL2289915 0.76
SCHEMBL28318499 0.74 TSHR (0.47)
SCHEMBL33528483 0.73 TSHR (0.50)
SCHEMBL2113464 0.72 ALOX15 (0.34)
SCHEMBL896541 0.70
SCHEMBL2114597 0.69 ALOX15 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9796193-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-24 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20120229583-A1 PHOTOCURABLE INK COMPOSITION, INK JET RECORDING METHOD, AND RECORDING MATTER SEIKO EPSON CORPORATION (JP) 2012-09-13 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-8192804-B2 Photocurable ink composition, ink jet recording method, and recording matter SEIKO EPSON CORPORATION (JP) 2012-06-05 US disclosed
US-20120133059-A1 RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-8158214-B2 Photocurable ink composition set, ink jet recording method, and recorded matter SEIKO EPSON CORPORATION (JP) 2012-04-17 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-7763686-B2 Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization CANON KABUSHIKI KAISHA (JP) 2010-07-27 US disclosed
US-20090041946-A1 Photocuable Ink Composition Set, Ink Jet Recording Method, and Recorded Matter SEIKO EPSON CORPORATION (JP) 2009-02-12 US disclosed
US-20060194935-A1 Process for producing polyalkenyl ether CANON KABUSHIKI KAISHA (JP) 2006-08-31 US disclosed