SCHEMBL2116184

SCHEMBL2116184

C=COCCOCCOCC(C)C=C(C)C(=O)O

nearest known ligand 0.30

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.30
TP53 P04637 2/20 0.30
TSHR P16473 2/20 0.30
HIF1A Q16665 2/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2113052 0.98
SCHEMBL9109618 0.85 PLA2G2C (0.37) ALDH1A1TP53TSHRHIF1AHSD17B10
SCHEMBL2114534 0.84 TSHR (0.33) TSHR
SCHEMBL2113452 0.81
SCHEMBL1623092 0.78 APEX1 (0.33) ALDH1A1
SCHEMBL16616024 0.77 ALDH1A1 (0.35) ALDH1A1TP53TSHRHIF1AHSD17B10
SCHEMBL474987 0.76
SCHEMBL2289781 0.74 ALDH1A1 (0.33) ALDH1A1TP53TSHRHIF1AHSD17B10
SCHEMBL148737 0.74 ALDH1A1 (0.33) ALDH1A1TP53TSHRHIF1AHSD17B10
SCHEMBL16105656 0.74 ALDH1A1 (0.33) ALDH1A1TP53TSHRHIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9796193-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-24 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20130258015-A1 ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-20130141504-A1 LIGHT-CURABLE INK COMPOSITION FOR INK JET RECORDING AND INK JET RECORDING METHOD USING THE SAME SEIKO EPSON CORPORATION (JP) 2013-06-06 US disclosed
US-20120229583-A1 PHOTOCURABLE INK COMPOSITION, INK JET RECORDING METHOD, AND RECORDING MATTER SEIKO EPSON CORPORATION (JP) 2012-09-13 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-8192804-B2 Photocurable ink composition, ink jet recording method, and recording matter SEIKO EPSON CORPORATION (JP) 2012-06-05 US disclosed
US-20120133059-A1 RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-8158214-B2 Photocurable ink composition set, ink jet recording method, and recorded matter SEIKO EPSON CORPORATION (JP) 2012-04-17 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-20090041946-A1 Photocuable Ink Composition Set, Ink Jet Recording Method, and Recorded Matter SEIKO EPSON CORPORATION (JP) 2009-02-12 US disclosed