SCHEMBL211622

SCHEMBL211622

CC(O)NC1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.44
ATM Q13315 1/20 0.42
GAA P10253 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
ALDH1A1 P00352 3/20 0.41
HSD17B10 Q99714 1/20 0.41
EPHX1 P07099 7/20 0.39
SIGMAR1 Q99720 2/20 0.39
CYP3A4 P08684 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
TP53 P04637 1/20 0.39
MAPT P10636 1/20 0.39
EPHX2 P34913 1/20 0.39
DPP4 P27487 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1153410 1.00 KDM4E (0.44) KDM4EATMGAAL3MBTL1ALDH1A1
SCHEMBL11461186 1.00 KDM4E (0.44) KDM4EATMGAAL3MBTL1ALDH1A1
SCHEMBL11457855 1.00 KDM4E (0.44) KDM4EATMGAAL3MBTL1ALDH1A1
Hydrochloric Acid SCHEMBL11271861 0.97 KDM4E (0.43) KDM4EATMGAAL3MBTL1ALDH1A1
SCHEMBL5226180 0.97
SCHEMBL6026665 0.92
SCHEMBL6026521 0.86
SCHEMBL22901392 0.85 KDM4E (0.35) KDM4EATMGAAL3MBTL1ALDH1A1
Bromide SCHEMBL2833944 0.83
SCHEMBL18732943 0.81 KDM4E (0.39) KDM4EATMGAAL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 519 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119162093-A Culture medium and culture method for promoting proliferation of spermatogonial stem cells in vitro 内蒙古医科大学 2024-12-20 CN claimed
CN-119020118-A Corrosion-inhibiting semiconductor chip cleaning agent and preparation method and application thereof 浙江奥首材料科技有限公司 2024-11-26 CN claimed
US-20240368505-A1 FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE THEREOF Tan Kah Kee Innovation Laboratory (CN) 2024-11-07 US claimed
CN-118692720-A Conduction reinforcing auxiliary agent for conductive copper paste, preparation method thereof and high-conductivity copper paste 苏州锦艺新材料科技股份有限公司 2024-09-24 CN claimed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
CN-118048155-A Titanium nitride etching liquid, preparation method, application and cleaning method thereof 浙江奥首材料科技有限公司 2024-05-17 CN claimed
CN-117385363-A Gas phase rust-resistant moisture-absorbing protection device for ammeter box 国网数字科技控股有限公司 2024-01-12 CN claimed
EP-3461552-B1 CARBON DIOXIDE ABSORBENT AND APPARATUS OF SEPARATING AND RECOVERING CARBON DIOXIDE TOSHIBA KK (JP) 2023-12-13 EP claimed
WO-2023184346-A1 WATER BASED SEMI-SYNTHETIC METAL WORKING FLUID COMPOSITION CONTAINING AN ALKYL ALCOHOL AMINE DOW GLOBAL TECHNOLOGIES LLC (US) 2023-10-05 WO claimed
CN-116731798-A Fluorine-free cleaning agent, and preparation method and application thereof 嘉庚创新实验室 2023-09-12 CN claimed
CN-105247021-A Additive composition and industrial process fluid FUCHS PETROLUB SE 2016-01-13 CN claimed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
WO-2007006585-A2 SYNTHESIS OF A POROUS AND/OR STRATIFIED STRUCTURE MANGANESE OXIDE ELSPER RUEDIGER (DE) 2007-01-18 WO claimed
EP-1361245-A1 Amino-functional polysiloxanes SigmaKalon Group B.V. (NL) 2003-11-12 EP claimed
US-5959001-A LOW VISCOSITY; MIXTURE CONTAINING PIGMENT, PASTE-MAKING AGENT, AMINE OR SALT, ADDITION HOMO- OR COPOLYMER BAYER AKTIENGESELLSCHAFT (DE) 1999-09-28 US claimed
US-5281264-A Salt of disazo acid dye containing pyrrazole ring and basic dye, inks ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 1994-01-25 US claimed
US-4217237-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine EXXON RESEARCH & ENGINEERING CO. (US) 1980-08-12 US claimed
US-4112050-A Process for removing carbon dioxide containing acidic gases from gaseous mixtures using a basic salt activated with a hindered amine EXXON RESEARCH & ENGINEERING CO. (US) 1978-09-05 US claimed
US-3977994-A Rust inhibiting composition UNIVERSAL OIL PRODUCTS COMPANY (US) 1976-08-31 US claimed