⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2960816 | 0.97 | — | — | |
| SCHEMBL3037560 | 0.97 | — | — | |
| SCHEMBL16724746 | 0.88 | — | — | |
| SCHEMBL274353 | 0.87 | — | — | |
| SCHEMBL3872463 | 0.87 | — | — | |
| SCHEMBL2956430 | 0.86 | — | — | |
| SCHEMBL34977 | 0.85 | — | — | |
| SCHEMBL647016 | 0.84 | — | — | |
| SCHEMBL646622 | 0.84 | — | — | |
| SCHEMBL9066630 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 327 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| US-20250143307-A1 | GRAFTABLE BIOCIDAL LINKERS AND POLYMERS AND USES THEREOF | DEBOGY MOLECULAR, INC. (US) | 2025-05-08 | — | — | US | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| WO-2023102567-A2 | GRAFTABLE BIOCIDAL LINKERS AND POLYMERS AND USES THEREOF | DEBOGY MOLECULAR, INC. (US) | 2023-06-08 | — | — | WO | claimed |
| CN-111565859-B | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| EP-3444026-B1 | MICROCAPSULES PRODUCED FROM BLENDED SOL-GEL PRECURSORS AND METHOD FOR PRODUCING THE SAME | INT FLAVORS & FRAGRANCES INC (US) | 2022-05-04 | — | — | EP | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| CN-112898678-A | Supercritical micro-foaming polypropylene material | 江苏宇豪新材料科技有限公司 | 2021-06-04 | — | — | CN | claimed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | claimed |
| EP-1959485-A2 | Activated chemical process for enhancing material properties of dielectric films | Air Products and Chemicals, Inc. (US) | 2008-08-20 | — | — | EP | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-5391677-A | Acrylic-functional organopolysiloxane and method for the preparation thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-02-21 | — | — | US | claimed |