⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16724746 | 0.94 | — | — | |
| SCHEMBL633732 | 0.94 | — | — | |
| SCHEMBL211737 | 0.87 | — | — | |
| SCHEMBL4862588 | 0.86 | — | — | |
| SCHEMBL3037560 | 0.84 | — | — | |
| SCHEMBL2960816 | 0.84 | — | — | |
| SCHEMBL14346751 | 0.84 | — | — | |
| SCHEMBL9842019 | 0.84 | — | — | |
| SCHEMBL27189028 | 0.84 | — | — | |
| SCHEMBL3872463 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230304139-A1 | METHODS FOR APPLYING DECORATIVE METAL FILMS ON POLYMERIC SURFACES | VERGASON TECHNOLOGY | 2023-09-28 | — | — | US | claimed |
| WO-2023183902-A1 | METHODS FOR APPLYING DECORATIVE METAL FILMS ON POLYMERIC SURFACES | VERGASON TECHNOLOGY, INC. (US) | 2023-09-28 | — | — | WO | claimed |
| CN-107286346-A | Alkane epoxide blocks the preparation method of dimethyl silicone polymer | 江苏科幸新材料股份有限公司 | 2017-10-24 | — | — | CN | claimed |
| CN-102652355-A | Wet oxidation process performed on a dielectric material formed from a flowable CVD process | APPLIED MATERIALS INC | 2012-08-29 | — | — | CN | claimed |
| US-20120142198-A1 | WET OXIDATION PROCESS PERFORMED ON A DIELECTRIC MATERIAL FORMED FROM A FLOWABLE CVD PROCESS | APPLIED MATERIALS, INC. (US) | 2012-06-07 | — | — | US | claimed |
| WO-2011084223-A2 | WET OXIDATION PROCESS PERFORMED ON A DIELECTRIC MATERIAL FORMED FROM A FLOWABLE CVD PROCESS | APPLIED MATERIALS, INC. (US) | 2011-07-14 | — | — | WO | claimed |
| US-20110151677-A1 | WET OXIDATION PROCESS PERFORMED ON A DIELECTRIC MATERIAL FORMED FROM A FLOWABLE CVD PROCESS | APPLIED MATERIALS, INC. | 2011-06-23 | — | — | US | claimed |
| US-7704894-B1 | Method of eliminating small bin defects in high throughput TEOS films | NOVELLUS SYSTEMS, INC. (US) | 2010-04-27 | — | — | US | claimed |
| JP-2008523165-A | — | — | 2008-07-03 | — | — | JP | claimed |
| EP-1833880-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | Matsushita Electric Works, Ltd. (JP) | 2007-09-19 | — | — | EP | claimed |
| WO-2006062219-A1 | ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 2006-06-15 | — | — | WO | claimed |
| JP-6021242-A | — | — | None | — | — | JP | disclosed |
| US-12615976-B2 | Methods for depositing dielectric films with increased stability | APPLIED MATERIALS, INC. (US) | 2026-04-28 | — | — | US | disclosed |
| US-20250308883-A1 | INTEGRATING NITRIDE STRESS COMPENSATION LAYERS FOR THICK OXIDE WAFER CREATION | TOKYO ELECTRON LIMITED (JP) | 2025-10-02 | — | — | US | disclosed |
| US-20250283221-A1 | CARRIER RING WITH TABS | LAM RES CORP (US) | 2025-09-11 | — | — | US | disclosed |
| US-4019997-A | Silicone fluid useful as a brae fluid | GENERAL ELECTRIC COMPANY (US) | 1977-04-26 | — | — | US | disclosed |
| US-4005023-A | Silicone fluid useful as a brake fluid | GENERAL ELECTRIC COMPANY (US) | 1977-01-25 | — | — | US | disclosed |
| US-3984449-A | Hydrocarbonoxy-containing silicone fluids useful as hydraulic fluids | GENERAL ELECTRIC COMPANY (US) | 1976-10-05 | — | — | US | disclosed |
| US-3941741-A | POLYSILOXANE | GENERAL ELECTRIC COMPANY (US) | 1976-03-02 | — | — | US | disclosed |
| US-3933726-A | ACRYLIC ESTERS | GENERAL ELECTRIC COMPANY (US) | 1976-01-20 | — | — | US | disclosed |