SCHEMBL2118364

SCHEMBL2118364

C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL312484 1.00 LMNA (0.38) LMNATHRB
SCHEMBL372394 1.00 LMNA (0.38) LMNATHRB
SCHEMBL633062 1.00 LMNA (0.38) LMNATHRB
SCHEMBL11141247 1.00 LMNA (0.38) LMNATHRB
SCHEMBL19643453 1.00 LMNA (0.38) LMNATHRB
SCHEMBL7965378 1.00 LMNA (0.38) LMNATHRB
SCHEMBL22151303 1.00 LMNA (0.38) LMNATHRB
SCHEMBL22126689 1.00 LMNA (0.38) LMNATHRB
SCHEMBL22151302 1.00 LMNA (0.38) LMNATHRB
SCHEMBL59847 0.97 LMNA (0.33) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 295 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118291038-B Organosilicon non-stick material, preparation method and application 万华化学集团股份有限公司 2026-05-19 CN claimed
CN-118165644-B Preparation method and application of ultra-wear-resistant fingerprint-resistant UV-resistant coating 柯盛新材料有限公司 2026-05-19 CN claimed
EP-4735933-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF Gvd Corporation (US) 2026-05-06 EP claimed
EP-4735935-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF Gvd Corporation (US) 2026-05-06 EP claimed
EP-4735934-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF Gvd Corporation (US) 2026-05-06 EP claimed
CN-119955152-A Fluorine release film for AF glass screen high-viscosity silica gel protective film and preparation method thereof 湖北省御鼎新材料科技有限公司 2025-05-09 CN claimed
CN-119529463-A High-barrier packaging material and preparation method thereof 江西盐业包装有限公司 2025-02-28 CN claimed
CN-119376178-A Preparation method of mask dustproof system for extreme ultraviolet lithography 江苏科麦特科技发展有限公司 2025-01-28 CN claimed
WO-2025007115-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF GVD CORPORATION (US) 2025-01-02 WO claimed
WO-2025007129-A2 SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF GVD CORPORATION (US) 2025-01-02 WO claimed
US-20200171869-A1 PRODUCTION OF A WIDE GAMUT OF STRUCTURAL COLORS USING BINARY MIXTURES OF PARTICLES WITH A POTENTIAL APPLICATION IN INK JET PRINTING THE UNIVERSITY OF AKRON (US) 2020-06-04 US claimed
CN-111057462-A Ultra-low refractive index high fluorine content UV curing polyurethane acrylate coating 中昊北方涂料工业研究设计院有限公司 2020-04-24 CN claimed
CN-110791066-A Flame-retardant MOFs-CNTs modified polylactic acid super-hydrophobic material and preparation method thereof 于素阁 2020-02-14 CN claimed
CN-110541975-A polyolefin pipe material capable of self-cleaning, preventing scaling and waxing as well as preparation method and application thereof ZHEJIANG WEIXING NEW BUILDING MATERIALS CO LTD 2019-12-06 CN claimed
US-10245625-B2 Carbon nanotube-based robust steamphobic surfaces THE UNIVERSITY OF AKRON (US) 2019-04-02 US claimed
US-9905855-B2 Binder composition for non-aqueous secondary battery electrode TOYO INK SC HOLDINGS CO., LTD. (JP) 2018-02-27 US claimed
US-20140213130-A1 CARBON NANOTUBE-BASED ROBUST STEAMPHOBIC SURFACES THE UNIVERSITY OF AKRON (US) 2014-07-31 US claimed
US-7642042-B2 Polymer, top coating layer, top coating composition and immersion lithography process using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-01-05 US claimed
EP-1694687-B1 SPECIFIC PROCESS FOR PREPARING SILICON COMPOUNDS BEARING FLUOROALKYL GROUPS BY HYDROSILYLATION DEGUSSA (DE) 2007-07-11 EP claimed
US-20070155925-A1 Polymer, top coating layer, top coating composition and immersion lithography process using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-07-05 US claimed