Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.48 |
| ▸ | SLC6A12 | P48065 | 5/20 | 0.37 |
| ▸ | SLC6A11 | P48066 | 5/20 | 0.37 |
| ▸ | SLC6A13 | Q9NSD5 | 5/20 | 0.37 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | SLC6A1 | P30531 | 2/20 | 0.32 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRR1 | P24046 | 1/20 | 0.32 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19090912 | 0.89 | HSD11B1 (0.45) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL19090914 | 0.89 | HSD11B1 (0.45) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL19090845 | 0.89 | HSD11B1 (0.45) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL19091011 | 0.89 | HSD11B1 (0.45) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL14123210 | 0.87 | HSD11B1 (0.48) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL24631338 | 0.85 | HSD11B1 (0.40) | HSD11B1SLC6A12SLC6A11SLC6A13 | |
| SCHEMBL19982307 | 0.85 | HSD11B1 (0.40) | HSD11B1SLC6A12SLC6A11SLC6A13 | |
| SCHEMBL7859286 | 0.84 | HSD11B1 (0.58) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL7046134 | 0.84 | HSD11B1 (0.58) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 | |
| SCHEMBL14123079 | 0.80 | HSD11B1 (0.42) | HSD11B1SLC6A12SLC6A11SLC6A13SLC1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314945-A1 | NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-20220397825-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROLLING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-15 | — | — | US | disclosed |
| US-20210055656-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-25 | — | — | US | disclosed |
| US-20200409262-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20190235380-A1 | NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMING METHOD, CURED FILM, AND METHOD OF PRODUCING CURED FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |