Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2118981 | 0.78 | TSHR (0.45) | TSHRLMNAALDH1A1KMT2A | |
| SCHEMBL11296271 | 0.78 | HPGD (0.42) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL2119096 | 0.78 | TSHR (0.51) | TSHRALDH1A1 | |
| SCHEMBL3410115 | 0.77 | HPGD (0.43) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL32688530 | 0.75 | HPGD (0.51) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL9081564 | 0.75 | TSHR (0.60) | TSHRALDH1A1 | |
| SCHEMBL27820116 | 0.75 | HPGD (0.39) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL11294328 | 0.74 | ALDH1A1 (0.38) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL11603244 | 0.73 | HPGD (0.53) | HPGDLMNASMN1; SMN2ALDH1A1POLB | |
| SCHEMBL1316621 | 0.73 | ALDH1A1 (0.47) | TSHRHPGDLMNAALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| EP-0011481-B1 | RUPTURABLE CONTAINERS FOR FLUIDS SUCH AS PHOTOGRAPHIC PROCESSING FLUIDS AND PHOTOGRAPHIC FILM UNITS INCLUDING SUCH CONTAINERS OF PROCESSING FLUIDS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1982-11-03 | — | — | EP | disclosed |
| EP-0011481-A1 | Rupturable containers for fluids such as photographic processing fluids and photographic film units including such containers of processing fluids | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1980-05-28 | — | — | EP | disclosed |
| US-4188219-A | ACRYLIC ESTER-ACRYLIC NORBRONYL ESTER COPOLYMERS, PHOTOGRAPHIC FILMS | EASTMAN KODAK COMPANY (US) | 1980-02-12 | — | — | US | disclosed |