SCHEMBL2123995

SCHEMBL2123995

CCCCN(C(C)=O)C(C)=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.46
CA1 P00915 2/20 0.46
CA9 Q16790 2/20 0.46
MMP1 P03956 1/20 0.43
MMP2 P08253 1/20 0.43
MMP3 P08254 1/20 0.43
MMP8 P22894 1/20 0.43
CES1 P23141 6/20 0.40
CES2 O00748 5/20 0.39
ALDH1A1 P00352 5/20 0.39
CHRM2 P08172 2/20 0.38
CHRM4 P08173 2/20 0.38
CHRM5 P08912 2/20 0.38
CHRM1 P11229 2/20 0.38
CHRM3 P20309 2/20 0.38
AKR1B1 P15121 1/20 0.36
TP53 P04637 1/20 0.36
ALDH2 P05091 1/20 0.36
ATM Q13315 1/20 0.36
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1940546 0.92 CES1 (0.42) CA12CA1CA9CES1CES2
SCHEMBL2484241 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL28968204 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL1671981 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL2484947 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL9550793 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL15334858 0.90 DNM1 (0.46) CA12CA1CA9CES1CES2
SCHEMBL17363593 0.87 CA12 (0.41) CA12CA1CA9MMP1MMP2
Hydrochloric Acid SCHEMBL11688295 0.85 CA12 (0.40) CA12CA1CA9MMP1MMP2
SCHEMBL22605042 0.85 CA12 (0.40) CA12CA1CA9MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2444462-A1 ELECTRICALLY CONDUCTIVE INK AND PROCESS FOR PRODUCTION OF BASE MATERIAL HAVING ELECTRICALLY CONDUCTIVE COATING FILM ATTACHED THERETO USING SAME Bando Chemical Industries, Ltd. (JP) 2012-04-25 EP claimed
US-5166433-A Zirconium oxide, copper oxide, cobalt oxide or nickel oxide as catalysts for forming amines BASF AKTIENGESELLSCHAFT (DE) 1992-11-24 US claimed
US-4207199-A COMPOUND CONTAINING ACYL GROUPS ADSORBED ON WATER-INSOLUBLE INORGANIC COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1980-06-10 US claimed
US-9627217-B2 Silicon-containing EUV resist underlayer film-forming composition including additive NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-18 US disclosed
US-8476351-B2 Black composition, black coating composition, resin black matrix, color filter for liquid crystal display and liquid crystal display TORAY INDUSTRIES, INC. (JP) 2013-07-02 US disclosed
EP-2444462-A1 ELECTRICALLY CONDUCTIVE INK AND PROCESS FOR PRODUCTION OF BASE MATERIAL HAVING ELECTRICALLY CONDUCTIVE COATING FILM ATTACHED THERETO USING SAME Bando Chemical Industries, Ltd. (JP) 2012-04-25 EP disclosed
US-7829609-B2 Composition, article and their production method, and film and its production method FUJIFILM CORPORATION (JP) 2010-11-09 US disclosed
US-7829609-B2 Composition, article and their production method, and film and its production method FUJIFILM CORPORATION (JP) 2010-11-09 US disclosed
EP-2025711-A1 Composition, article and their production method, and film and its production method Fujifilm Corporation (JP) 2009-02-18 EP disclosed
US-20090029169-A1 excellent transparency; low thermal expansion; hybrid; surface-modified cellulose crystal in resin matrix; surfactant and inorganic ion adsorbed; modified with an organic group; bonded to silicon oxide, titanium oxide, aluminum oxide, zirconium oxide, barium oxide or hydroxyapatite; molding material FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-20090029169-A1 excellent transparency; low thermal expansion; hybrid; surface-modified cellulose crystal in resin matrix; surfactant and inorganic ion adsorbed; modified with an organic group; bonded to silicon oxide, titanium oxide, aluminum oxide, zirconium oxide, barium oxide or hydroxyapatite; molding material FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
EP-0888436-B1 SOLID COMPOSITION OF HETEROCYCLIC COMPOUNDS AND/OR OXIME ESTERS AND INERT POROUS CARRIER MATERIALS BASF AG (DE) 2000-06-21 EP disclosed
US-6063750-A AMMONIUM NITRITE WITH NITRILE GROUPS WITH PHYLOSILICATES CLARIANT GMBH (DE) 2000-05-16 US disclosed
WO-1999014306-A2 BLEACHING ACTIVATORS IN THE FORM OF STORAGE-STABLE GRANULES CLARIANT GMBH (DE) 1999-03-25 WO disclosed
WO-1999014302-A1 BLEACHING ACTIVATORS IN THE FORM OF GRANULES CLARIANT GMBH (DE) 1999-03-25 WO disclosed
EP-0888436-A1 SOLID COMPOSITION OF HETEROCYCLIC COMPOUNDS AND/OR OXIME ESTERS AND INERT POROUS CARRIER MATERIALS BASF AKTIENGESELLSCHAFT (DE) 1999-01-07 EP disclosed
US-5716569-A COMMINUTING THE AGGLOMERATED DRY MIXTURE CONTAINING INORGANIC BINDER HOECHST AKTIENGESELLSCHAFT (DE) 1998-02-10 US disclosed
WO-1997033964-A1 SOLID COMPOSITION OF HETEROCYCLIC COMPOUNDS AND/OR OXIME ESTERS AND INERT POROUS CARRIER MATERIALS BASF AKTIENGESELLSCHAFT (DE) 1997-09-18 WO disclosed
EP-0710716-A2 Granulated bleach actuators and production thereof HOECHST AKTIENGESELLSCHAFT (DE) 1996-05-08 EP disclosed
US-4207199-A COMPOUND CONTAINING ACYL GROUPS ADSORBED ON WATER-INSOLUBLE INORGANIC COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1980-06-10 US disclosed