SCHEMBL2126198

SCHEMBL2126198

C#CC(C)(O)C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19357108 0.75 ALDH1A1 (0.40)
SCHEMBL18482211 0.73
SCHEMBL1472448 0.73
SCHEMBL3226761 0.73
SCHEMBL236180 0.73
SCHEMBL7893712 0.69
SCHEMBL12388236 0.69
SCHEMBL213668 0.69
SCHEMBL483116 0.69
SCHEMBL11653262 0.69 TSHR (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8256884-B2 Ink jet ink and ink set E I DU PONT DE NEMOURS AND COMPANY (US) 2012-09-04 US claimed
US-20100255201-A1 INK JET INK AND INK SET E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-10-07 US claimed
WO-2009124157-A1 INK JET INK AND INK SET E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-10-08 WO claimed
US-7485611-B2 Supercritical fluid-based cleaning compositions and methods ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2009-02-03 US claimed
US-7294528-B2 Supercritical fluid-assisted deposition of materials on semiconductor substrates ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2007-11-13 US claimed
US-20070149429-A9 SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS POCO GRAPHITE, INC. 2007-06-28 US claimed
US-7030168-B2 Supercritical fluid-assisted deposition of materials on semiconductor substrates ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2006-04-18 US claimed
EP-1627429-A2 SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2006-02-22 EP claimed
US-20050181613-A1 Supercritical fluid-assisted deposition of materials on semiconductor substrates ADVANCED TECHNOLOGY MATERIALS, INC. 2005-08-18 US claimed
WO-2004102621-A2 SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2004-11-25 WO claimed
US-20040224865-A1 SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS ADVANCED TECHNOLOGY MATERIALS, INC. 2004-11-11 US claimed
WO-2003057811-A1 SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2003-07-17 WO claimed
WO-2003058680-A2 SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2003-07-17 WO claimed
US-20030125225-A1 Supercritical fluid cleaning of semiconductor substrates ENTEGRIS, INC. 2003-07-03 US claimed
US-20030124785-A1 Supercritical fluid-assisted deposition of materials on semiconductor substrates ATMI, INC. 2003-07-03 US claimed
WO-2024088062-A1 THERMALLY-CONDUCTIVE ADDITION TYPE ORGANOSILICON COMPOSITION FOR POTTING 江西蓝星星火有机硅有限公司 2024-05-02 WO disclosed
CN-115160974-A Ultraviolet curing adhesive with high dielectric strength, and preparation method and application thereof 艾硕新材料(上海)有限公司 2022-10-11 CN disclosed
EP-0186439-A2 Heat-curable silicone compositions, use thereof and stabilizer therefor DOW CORNING CORPORATION (US) 1986-07-02 EP disclosed
EP-0117056-A2 Storage stable polyorganosiloxane compositions Toray Silicone Company Limited (JP) 1984-08-29 EP disclosed
EP-0091291-A2 Room temperature stable, heat activated organopolysiloxane compositions Toray Silicone Company Limited (JP) 1983-10-12 EP disclosed