SCHEMBL21296048

SCHEMBL21296048

CCCCCCC(=NOC(=O)c1ccccc1)C(=O)c1ccc2c(c1)c1cc(C(=O)C(CC3CCCCC3)=NOC(=O)c3ccccc3)ccc1n2CC

nearest known ligand 0.40

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 10/20 0.40
NPC1 O15118 3/20 0.39
CNR1 P21554 1/20 0.39
RAB9A P51151 1/20 0.35
RORC P51449 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29544623 1.00 CNR2 (0.40) CNR2NPC1CNR1RAB9ARORC
SCHEMBL25213426 0.97 NPC1 (0.40) CNR2NPC1CNR1RAB9ARORC
SCHEMBL29395430 0.97 NPC1 (0.40) CNR2NPC1CNR1RAB9ARORC
SCHEMBL30092281 0.93 NPC1 (0.39) CNR2NPC1CNR1RAB9ARORC
SCHEMBL28936992 0.90 CNR2 (0.38) CNR2NPC1CNR1RAB9ARORC
SCHEMBL21898018 0.90 CNR2 (0.38) CNR2NPC1CNR1RAB9ARORC
SCHEMBL31099279 0.90 CNR2 (0.38) CNR2NPC1CNR1RAB9ARORC
SCHEMBL22550094 0.87 CNR2 (0.44) CNR2NPC1CNR1RAB9A
SCHEMBL30379772 0.86 RORC (0.37) CNR2NPC1CNR1RORC
SCHEMBL26107329 0.86 RORC (0.37) CNR2NPC1CNR1RORC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118235091-A Transfer film, laminate having conductor pattern, method for producing laminate having conductor pattern, and method for producing transfer film 富士胶片株式会社 2024-06-21 CN disclosed
CN-116981997-A Method for manufacturing laminate with conductor pattern 富士胶片株式会社 2023-10-31 CN disclosed
CN-116917122-A Transfer film and method for producing conductor pattern 富士胶片株式会社 2023-10-20 CN disclosed
CN-116917806-A Method for manufacturing laminate with conductor pattern 富士胶片株式会社 2023-10-20 CN disclosed
CN-116917123-A Transfer film and method for producing conductor pattern 富士胶片株式会社 2023-10-20 CN disclosed
CN-116710845-A Transfer material and method for producing laminate 富士胶片株式会社 2023-09-05 CN disclosed
CN-116635789-A Transfer material and method for producing laminate 富士胶片株式会社 2023-08-22 CN disclosed
CN-116249939-A Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing electronic device 富士胶片株式会社 2023-06-09 CN disclosed
CN-110036341-B Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern, and method for producing cured film pattern 旭化成株式会社 2023-06-09 CN disclosed
CN-116149139-A Photosensitive composition, transfer film, pattern forming method, and method for manufacturing circuit wiring 富士胶片株式会社 2023-05-23 CN disclosed
CN-116018262-A Photosensitive transfer material, method for producing resin pattern, etching method, and method for producing electronic device 富士胶片株式会社 2023-04-25 CN disclosed
CN-115928007-A Transfer film for forming vapor deposition mask, method for producing vapor deposition mask, and vapor deposition mask 富士胶片株式会社 2023-04-07 CN disclosed
CN-115826352-A Photosensitive composition, transfer film, and method for producing laminate having conductor pattern 富士胶片株式会社 2023-03-21 CN disclosed
CN-115729044-A Method for manufacturing laminate having conductor pattern, and transfer film 富士胶片株式会社 2023-03-03 CN disclosed
CN-115729036-A Transfer film and method for manufacturing laminate having conductor pattern 富士胶片株式会社 2023-03-03 CN disclosed
CN-115685672-A Transfer film and method for manufacturing laminate having conductor pattern 富士胶片株式会社 2023-02-03 CN disclosed
CN-115247252-A Transfer film for vapor deposition mask production, vapor deposition mask, and method for producing vapor deposition mask 富士胶片株式会社 2022-10-28 CN disclosed
CN-114609864-A Photosensitive resin composition 旭化成株式会社 2022-06-10 CN disclosed
CN-106918995-B Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern and cured film pattern, and display device 旭化成株式会社 2020-06-02 CN disclosed
WO-2019164016-A1 TRANSFER FILM, RESIN PATTERN FORMING METHOD USING TRANSFER FILM, AND CURED FILM PATTERN FORMING METHOD 旭化成株式会社 2019-08-29 WO disclosed