SCHEMBL21325682

SCHEMBL21325682

CCCNC(=O)c1c(F)c(F)c(S(=O)(=O)ON2C(=O)c3cccc4cccc(c34)C2=O)c(F)c1F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 10/20 0.47
▸ ALDH1A1 P00352 8/20 0.47
▸ HPGD P15428 7/20 0.47
▸ MAPT P10636 6/20 0.46
▸ MEN1 O00255 5/20 0.46
▸ KMT2A Q03164 5/20 0.46
▸ HTT P42858 1/20 0.46
▸ LMNA P02545 1/20 0.44
▸ THRB P10828 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.42
▸ CYP1A2 P05177 2/20 0.37
▸ HSD17B10 Q99714 2/20 0.37
▸ AKR1B1 P15121 1/20 0.37
▸ ALOX15 P16050 1/20 0.37
▸ CYP3A4 P08684 1/20 0.37
▸ XBP1 P17861 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ NPSR1 Q6W5P4 1/20 0.37
▸ POLB P06746 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17461711 0.85 KDM4E (0.41) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL21339668 0.84 KDM4E (0.31) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL21325680 0.81 KDM4E (0.61) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL60582 0.80 KDM4E (0.65) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL19361374 0.78 KDM4E (0.62) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL17461331 0.77 KDM4E (0.43) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL19999244 0.76 KDM4E (0.56) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL19999242 0.76 TDP1 (0.52) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL20006538 0.75 KDM4E (0.55) KDM4EALDH1A1HPGDMAPTMEN1
SCHEMBL21339667 0.75 TDP1 (0.45) KDM4EALDH1A1HPGDMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10831102-B2 Photoactive polymer brush materials and EUV patterning using the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-11-10 — — US disclosed
US-20190271913-A1 PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-09-05 — — US disclosed
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