SCHEMBL21325680

SCHEMBL21325680

CCCNC(=O)c1ccc(S(=O)(=O)ON2C(=O)c3cccc4cccc(c34)C2=O)cc1

nearest known ligand 0.61

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 8/20 0.61
▸ ALDH1A1 P00352 8/20 0.61
▸ HPGD P15428 6/20 0.61
▸ KMT2A Q03164 7/20 0.58
▸ MAPT P10636 6/20 0.58
▸ MEN1 O00255 4/20 0.58
▸ HTT P42858 2/20 0.58
▸ LMNA P02545 1/20 0.58
▸ THRB P10828 1/20 0.58
▸ VDR P11473 2/20 0.48
▸ F2 P00734 1/20 0.48
▸ POLB P06746 2/20 0.45
▸ L3MBTL1 Q9Y468 1/20 0.45
▸ TDP1 Q9NUW8 1/20 0.44
▸ CA2 P00918 2/20 0.40
▸ EGFR P00533 1/20 0.39
▸ CA1 P00915 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ CYP1B1 Q16678 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17461701 0.85 ALDH1A1 (0.53) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL10409879 0.81 KDM4E (0.75) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL21325682 0.81 KDM4E (0.47) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL10410862 0.79 KDM4E (0.72) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL462047 0.76 ALDH1A1 (1.00) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL17461332 0.76 KDM4E (0.54) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL21339667 0.75 TDP1 (0.45) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL462229 0.75 ALDH1A1 (0.78) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL31218469 0.75 ALDH1A1 (1.00) KDM4EALDH1A1HPGDKMT2AMAPT
SCHEMBL1088835 0.75 ALDH1A1 (1.00) KDM4EALDH1A1HPGDKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10831102-B2 Photoactive polymer brush materials and EUV patterning using the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-11-10 — — US disclosed
WO-2019171188-A1 PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-09-12 — — WO disclosed
US-20190271913-A1 PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-09-05 — — US disclosed
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