SCHEMBL2134249

SCHEMBL2134249

C[C](N=C=S)N=C=S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323797 0.74
SCHEMBL14846362 0.72
SCHEMBL14278510 0.69
SCHEMBL28432496 0.69
SCHEMBL28942397 0.67
SCHEMBL28537221 0.67
SCHEMBL31265539 0.64
SCHEMBL27490888 0.64
SCHEMBL28948351 0.62
SCHEMBL30530530 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240149389-A1 POLISHING PAD AND METHOD FOR PRODUCING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2024-05-09 US disclosed
US-20240084067-A1 NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER TOKUYAMA CORPORATION (JP) 2024-03-14 US disclosed
US-11883925-B2 Polishing pad and method for manufacturing same FUJIBO HOLDINGS, INC. (JP) 2024-01-30 US disclosed
EP-4286435-A1 NOVEL CURABLE COMPOSITION CONTAINING CYCLIC MONOMER Tokuyama Corporation (JP) 2023-12-06 EP disclosed
US-20230373055-A1 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHED PRODUCT FUJIBO HOLDINGS, INC. (JP) 2023-11-23 US disclosed
US-20230365739-A1 CURABLE COMPOSITION AND CURED ARTICLE THEREOF TOKUYAMA CORPORATION (JP) 2023-11-16 US disclosed
US-20230364736-A1 POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2023-11-16 US disclosed
US-20230265053-A1 POLYFUNCTIONAL QUATERNARY AMMONIUM SALT OF SULFONIC ACID HAVING ACTIVE-HYDROGEN GROUPS TOKUYAMA CORPORATION (JP) 2023-08-24 US disclosed
US-20230173637-A1 POLISHING PAD, POLISHING UNIT, POLISHING DEVICE, AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2023-06-08 US disclosed
US-11654526-B2 Polishing pad and method for manufacturing same FUJIBO HOLDINGS, INC. (JP) 2023-05-23 US disclosed
EP-0326961-A2 Method for producing laundry-resistant recorded medium KANZAKI PAPER MANUFACTURING CO., LTD. (JP) 1989-08-09 EP disclosed
US-4729792-A DISPERSION, OILS, CURING AGENTS, POLYSALT FORMATION, POLYAMINE, LIPOPHILIC, NONPOLAR THE STANDARD REGISTER COMPANY (US) 1988-03-08 US disclosed
EP-0223428-A1 Process for producing oil-containing microcapsules THE STANDARD REGISTER COMPANY (US) 1987-05-27 EP disclosed
US-4642281-A CORE OF POLYMER AND HIGH BOILING SOLVENT; SHELL POLYMER BY IN-SITU POLYMERIZATION FUJI PHOTO FILM CO., LTD. (JP) 1987-02-10 US disclosed
US-4520091-A Encapsulated electrostatographic toner material FUJI PHOTO FILM CO., LTD. (JP) 1985-05-28 US disclosed
US-4468446-A Electrostatographic encapsulated toner material improved in powder characteristics FUJI PHOTO FILM CO., LTD. (JP) 1984-08-28 US disclosed
US-4465756-A Electrostatographic enscapsulated toner material improved in chargeability FUJI PHOTO FILM CO., LTD. (JP) 1984-08-14 US disclosed
US-4465755-A Pressure fixable electrostatographic toner material comprising encapsulated particles containing curing agent FUJI PHOTO FILM CO., LTD. 1984-08-14 US disclosed
US-4439581-A INTERFACIAL POLYMERIZATION OF A POLYVALENT ISOCYANATE, UNSATURATED SULFONATE POLYMER KANZAKI PAPER MANUFACTURING CO., LTD. (JP) 1984-03-27 US disclosed
US-4021595-A Pressure sensitive recording sheet FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed