SCHEMBL2134253

SCHEMBL2134253

CC(N=C=S)N=C=S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Isothiocyanate SCHEMBL213474 0.77
SCHEMBL28990111 0.74
SCHEMBL28220625 0.74
SCHEMBL945811 0.72
SCHEMBL11576483 0.72
SCHEMBL7808164 0.72
SCHEMBL944822 0.72
SCHEMBL6658722 0.72
SCHEMBL2543806 0.72
SCHEMBL1024887 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230390890-A1 POLYMERIZABLE FUNCTIONAL GROUP-CONTAINING MICROBALLOON TOKUYAMA CORPORATION (JP) 2023-12-07 US disclosed
EP-4205904-A1 POLYMERIZABLE FUNCTIONAL GROUP-CONTAINING MICROBALLOON Tokuyama Corporation (JP) 2023-07-05 EP disclosed
US-20230173637-A1 POLISHING PAD, POLISHING UNIT, POLISHING DEVICE, AND METHOD FOR MANUFACTURING POLISHING PAD FUJIBO HOLDINGS, INC. (JP) 2023-06-08 US disclosed
CN-114450126-A Polishing pad and method for manufacturing the same 富士纺控股株式会社 2022-05-06 CN disclosed
US-10920007-B2 Urethane resin comprising a polyrotaxane and polishing pad TOKUYAMA CORPORATION (JP) 2021-02-16 US disclosed
CN-111936268-A Polishing pad and method for manufacturing the same 富士纺控股株式会社 2020-11-13 CN disclosed
EP-2627678-B1 ANIONIC DISPERSION POLYMERIZATION PROCESS KEMIRA OYJ (FI) 2020-04-22 EP disclosed
WO-2020067401-A1 POLISHING PAD AND METHOD FOR PRODUCING POLISHED ARTICLE 富士紡ホールディングス株式会社 2020-04-02 WO disclosed
WO-2020032056-A1 CURABLE COMPOSITION CONTAINING POLYPSEUDOROTAXANE MONOMER 株式会社トクヤマ 2020-02-13 WO disclosed
EP-3543267-A1 URETHANE RESIN USING POLYROTAXANE, AND POLISHING PAD Tokuyama Corporation (JP) 2019-09-25 EP disclosed
EP-0223428-A1 Process for producing oil-containing microcapsules THE STANDARD REGISTER COMPANY (US) 1987-05-27 EP disclosed
US-4520091-A Encapsulated electrostatographic toner material FUJI PHOTO FILM CO., LTD. (JP) 1985-05-28 US disclosed
US-4468446-A Electrostatographic encapsulated toner material improved in powder characteristics FUJI PHOTO FILM CO., LTD. (JP) 1984-08-28 US disclosed
US-4465756-A Electrostatographic enscapsulated toner material improved in chargeability FUJI PHOTO FILM CO., LTD. (JP) 1984-08-14 US disclosed
US-4465755-A Pressure fixable electrostatographic toner material comprising encapsulated particles containing curing agent FUJI PHOTO FILM CO., LTD. 1984-08-14 US disclosed
US-4221605-A Sulfur foam process CHEVRON RESEARCH COMPANY (US) 1980-09-09 US disclosed
US-4111864-A SULFUR FOAM CHEVRON RESEARCH COMPANY (US) 1978-09-05 US disclosed
US-4021595-A Pressure sensitive recording sheet FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed
US-4011179-A CONTINUOUS SULFUR FOAM PREPARATION USING POLYISOCYANATES CHEVRON RESEARCH COMPANY (US) 1977-03-08 US disclosed
US-3993632-A PROPELLANT BINDER SHELL OIL COMPANY (US) 1976-11-23 US disclosed