SCHEMBL2134333

SCHEMBL2134333

C=CCC(C)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL798813 0.80
SCHEMBL15403861 0.79
SCHEMBL3139933 0.75
SCHEMBL798814 0.75
SCHEMBL10170871 0.75 TSHR (0.32)
SCHEMBL15403724 0.75
SCHEMBL1155321 0.75
SCHEMBL12144001 0.75
SCHEMBL629330 0.73 MAPT (0.35)
SCHEMBL726042 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115551862-B Macrocyclic inhibitors of peptidyl arginine deiminase 吉利德科学公司 2024-04-12 CN disclosed
EP-3812359-A1 METHOD FOR PRODUCING FLUORINATED COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2021-04-28 EP disclosed
US-10651286-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-05-12 US disclosed
US-20190305109-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2019-10-03 US disclosed
US-10325998-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-06-18 US disclosed
US-10269924-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-04-23 US disclosed
US-20170194497-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2017-07-06 US disclosed
US-20170194457-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2017-07-06 US disclosed
US-9633948-B2 Low energy etch process for nitrogen-containing dielectric layer GLOBALFOUNDRIES INC. (KY) 2017-04-25 US disclosed
US-9627533-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2017-04-18 US disclosed
US-7205330-B2 Inhibitors of hepatitis C virus NS3 protease SCHERING CORPORATION (US) 2007-04-17 US disclosed
US-7192957-B2 Compounds as inhibitors of hepatitis C virus NS3 serine protease SCHERING CORPORATION (US) 2007-03-20 US disclosed
US-7186747-B2 Compounds as inhibitors of hepatitis C virus NS3 serine protease SCHERING CORPORATION (US) 2007-03-06 US disclosed
US-20070049536-A1 Novel compounds as inhibitors of hepatitis C virus NS3 serine protease SCHERING CORPORATION 2007-03-01 US disclosed
US-20070042968-A1 Sulfur compounds as inhibitors of Hepatitis C virus NS3 serine protease SCHERING CORPORATION 2007-02-22 US disclosed
US-20070032434-A1 used for the treatment or prevention of HCV or amelioration the symptoms of hepatitis C infection, by modulating the interaction of an HCV polypeptide with HCV proteases SCHERING CORPORATION 2007-02-08 US disclosed
US-20070032433-A1 Novel peptides as NS3-serine protease inhibitors of hepatitis C virus SCHERING CORPORATION CORVAS INTERNATIONAL, LTD. 2007-02-08 US disclosed
US-7173057-B2 Ketoamides with cyclic P4'S as inhibitors of NS3 protease of hepatitis C virus SCHERING CORPORATION (US) 2007-02-06 US disclosed
EP-0273008-A2 Process for the preparation of 2,2-difluoropent-4-ene-carboxylic acids and derivatives CIBA-GEIGY AG (CH) 1988-06-29 EP disclosed
US-4730006-A BACTERICIDES MERRELL DOW PHARMACEUTICALS INC. (US) 1988-03-08 US disclosed