Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrahydrofuran SCHEMBL7184134 | 0.83 | MAPT (0.32) | MAPTNR1H2NR1H3 | |
| SCHEMBL1155321 | 0.80 | — | — | |
| SCHEMBL27527153 | 0.80 | MAPT (0.36) | MAPT | |
| SCHEMBL629470 | 0.80 | MAPT (0.36) | MAPT | |
| SCHEMBL28914056 | 0.79 | ALDH1A1 (0.34) | MAPT | |
| SCHEMBL30907077 | 0.78 | MAPT (0.35) | MAPT | |
| SCHEMBL8762310 | 0.76 | MAPT (0.34) | MAPT | |
| SCHEMBL27727629 | 0.76 | MAPT (0.34) | MAPT | |
| SCHEMBL7133238 | 0.75 | — | — | |
| SCHEMBL12144001 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9939729-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-04-10 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20170075224-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9522979-B2 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160229960-A1 | FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| EP-1963292-B1 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2012-02-22 | — | — | EP | disclosed |
| US-7700633-B2 | Organic compounds | NOVARTIS AG (CH) | 2010-04-20 | — | — | US | disclosed |
| US-20080262050-A1 | Organic Compounds | NOVARTIS AG (CH) | 2008-10-23 | — | — | US | disclosed |
| EP-1963292-A2 | ORGANIC COMPOUNDS | Novartis Pharma AG (CH) | 2008-09-03 | — | — | EP | disclosed |
| WO-2007067615-A2 | THIADIAZOLE DERIVATIVES AS ANTIDIABETIC AGENTS | NOVARTIS AG (CH) | 2007-06-14 | — | — | WO | disclosed |
| US-6548219-B2 | Transparent to deep ultraviolet (DUV) radiation | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-04-15 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020102490-A1 | Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions | GLOBALFOUNDRIES U.S. INC. | 2002-08-01 | — | — | US | disclosed |
| EP-0881266-A2 | Polymers inhibiting denaturation of adsorbed proteins | HÜLS AKTIENGESELLSCHAFT (DE) | 1998-12-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080262050-A1 | Organic Compounds | PTPRS, PTPRO, PTPRC | MAPT 3222/4885NR1H2 750/4885NR1H3 978/4885 |
| US-20160229960-A1 | FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN | RFT1, FEM1B, RER1 | MAPT 2672/4885NR1H2 547/4885NR1H3 664/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.