⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20836269 | 1.00 | — | — | |
| SCHEMBL25700 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL7878764 | 0.94 | — | — | |
| Fluoride SCHEMBL17473782 | 0.94 | — | — | |
| SCHEMBL5471789 | 0.89 | — | — | |
| Cyclopentane SCHEMBL692847 | 0.85 | PDK1 (0.31) | — | |
| SCHEMBL8733945 | 0.85 | — | — | |
| SCHEMBL104041 | 0.80 | — | — | |
| SCHEMBL3694042 | 0.78 | TSHR (0.36) | — | |
| SCHEMBL553855 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3597673-B1 | PHOTOCROSSLINKABLE POLYMER, INSULATING FILM, PLANARIZATION FILM, LYOPHILIC/LIQUID REPELLENT PATTERNED FILM, AND ORGANIC FIELD EFFECT TRANSISTOR DEVICE COMPRISING SAME | TOSOH CORP (JP) | 2023-06-07 | — | — | EP | disclosed |
| WO-2023074606-A1 | RESIN, INSULATING FILM AND ORGANIC FIELD EFFECT TRANSISTOR COMPRISING SAME | 東ソー株式会社 | 2023-05-04 | — | — | WO | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-11556056-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-17 | — | — | US | disclosed |
| EP-3556783-B1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| CN-110418808-B | Photocrosslinkable polymer, insulating film, planarizing film, lyophilic-lyophilic patterned film, and organic field effect transistor device comprising same | 东曹株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-109153653-B | Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink | DIC株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-114555653-A | Composition, cured product, sealing material for organic electroluminescent display element, and organic electroluminescent display device | 电化株式会社 | 2022-05-27 | — | — | CN | disclosed |
| CN-114555661-A | Composition, cured product, sealing material for organic electroluminescent display element, and organic electroluminescent display device | 电化株式会社 | 2022-05-27 | — | — | CN | disclosed |
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20120219912-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219905-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219908-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219904-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120100482-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20100039027-A1 | ORGANIC ELECTROLUMINESCENCE DEVICE | IDEMITSU KOSAN CO., LTD (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2113954-A1 | ORGANIC ELECTROLUMINESCENT DEVICE | Idemitsu Kosan Co., Ltd. (JP) | 2009-11-04 | — | — | EP | disclosed |