SCHEMBL2137461

SCHEMBL2137461

C=CC(=O)OCCO[Si](OC)(OC)OC

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.55
ALDH1A1 P00352 4/20 0.55
TP53 P04637 3/20 0.55
HIF1A Q16665 3/20 0.55
HSD17B10 Q99714 1/20 0.55
CYP3A4 P08684 2/20 0.50
HPGD P15428 1/20 0.50
THRB P10828 3/20 0.46
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
ATM Q13315 1/20 0.31
KEAP1 Q14145 1/20 0.30
NFE2L2 Q16236 1/20 0.30
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5835079 0.89 TSHR (0.57) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL63104 0.88 TSHR (0.64) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1010878 0.87 TSHR (0.46) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL29004482 0.83 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL23466722 0.83 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10606391 0.83 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL2133150 0.83 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL13129209 0.83 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL476966 0.82 TSHR (0.61) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL734061 0.80 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2571629-A2 STENCILS FOR HIGH-THROUGHPUT MICRON-SCALE ETCHING OF SUBSTRATES AND PROCESSES OF MAKING AND USING THE SAME Nano Terra Inc. (US) 2013-03-27 EP claimed
WO-2011146912-A2 STENCILS FOR HIGH-THROUGHPUT MICRON-SCALE ETCHING OF SUBSTRATES AND PROCESSES OF MAKING AND USING THE SAME NANO TERRA INC. (US) 2011-11-24 WO claimed
CN-114245812-B Latex for bonding fibrous structures 昕特玛德国有限公司 2024-08-23 CN disclosed
EP-4013819-B1 LATEX FOR BONDING FIBER STRUCTURES SYNTHOMER DEUTSCHLAND GMBH (DE) 2024-01-24 EP disclosed
EP-3530804-B1 LATEX BONDED TEXTILE FIBER STRUCTURE FOR CONSTRUCTION APPLICATIONS SYNTHOMER DEUTSCHLAND GMBH (DE) 2023-09-06 EP disclosed
US-20220282016-A1 LATEX FOR BONDING FIBER STRUCTURES SYNTHOMER DEUTSCHLAND GMBH (DE) 2022-09-08 US disclosed
EP-4013819-A1 LATEX FOR BONDING FIBER STRUCTURES Synthomer Deutschland GmbH (DE) 2022-06-22 EP disclosed
US-20130280540-A1 INTERLAYER FILM FOR LAMINATED GLASS, METHOD FOR PRODUCING SAME, AND LAMINATED GLASS USING SAME KURARAY CO., LTD. (JP) 2013-10-24 US disclosed
EP-2650267-A1 LAMINATED GLASS INTERLAYER, METHOD FOR PRODUCING SAME, AND LAMINATED GLASS USING SAME Kuraray Co., Ltd. (JP) 2013-10-16 EP disclosed
EP-2571629-A2 STENCILS FOR HIGH-THROUGHPUT MICRON-SCALE ETCHING OF SUBSTRATES AND PROCESSES OF MAKING AND USING THE SAME Nano Terra Inc. (US) 2013-03-27 EP disclosed
US-20120097329-A1 Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same MERCK PATENT GESELLSCHAFT (DE) 2012-04-26 US disclosed
WO-2011146912-A2 STENCILS FOR HIGH-THROUGHPUT MICRON-SCALE ETCHING OF SUBSTRATES AND PROCESSES OF MAKING AND USING THE SAME NANO TERRA INC. (US) 2011-11-24 WO disclosed
US-7901767-B2 Method for producing laminate, barrier film substrate, device and optical member FUJIFILM CORPORATION (JP) 2011-03-08 US disclosed
US-7901767-B2 Method for producing laminate, barrier film substrate, device and optical member FUJIFILM CORPORATION (JP) 2011-03-08 US disclosed
US-20080220198-A1 METHOD FOR PRODUCING LAMINATE, BARRIER FILM SUBSTRATE, DEVICE AND OPTICAL MEMBER FUJIFILM CORPORATION (JP) 2008-09-11 US disclosed
US-20080220198-A1 METHOD FOR PRODUCING LAMINATE, BARRIER FILM SUBSTRATE, DEVICE AND OPTICAL MEMBER FUJIFILM CORPORATION (JP) 2008-09-11 US disclosed
EP-0578498-B1 Acrylic polymer, its use and process for producing it NIPPON CATALYTIC CHEM IND (JP) 1997-04-16 EP disclosed
US-5574117-A SULFUR COMPOUND NIPPON SHOKUBAI CO., LTD. (JP) 1996-11-12 US disclosed
EP-0578498-A2 Acrylic polymer, its use and process for producing it NIPPON SHOKUBAI CO., LTD. (JP) 1994-01-12 EP disclosed