SCHEMBL2137487

SCHEMBL2137487

CCCCC(S)(S)CCCCOP(=O)(O)O.[Zn]

nearest known ligand 0.61

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ LPAR3 Q9UBY5 13/20 0.61
▸ LPAR2 Q9HBW0 9/20 0.61
▸ LPAR1 Q92633 6/20 0.61
▸ SMPD1 P17405 3/20 0.42
▸ LPAR5 Q9H1C0 1/20 0.41
▸ CYP3A4 P08684 1/20 0.39
▸ GGPS1 O95749 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28379716 0.86 LPAR3 (0.61) LPAR3LPAR2LPAR1SMPD1GGPS1
SCHEMBL6746776 0.82 LPAR3 (0.71) LPAR3LPAR2LPAR1SMPD1LPAR5
Phosphoric Acid Monododecyl Ester SCHEMBL28883739 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
Phosphoric Acid Monododecyl Ester SCHEMBL1004420 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
Hexadecyl Dihydrogen Phosphate SCHEMBL27692367 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
SCHEMBL28823130 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
SCHEMBL9339267 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
Hexadecyl Dihydrogen Phosphate SCHEMBL483431 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
Phosphoric Acid Monotetradecyl Ester SCHEMBL1005394 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5
SCHEMBL60047 0.79 LPAR3 (0.95) LPAR3LPAR2LPAR1SMPD1LPAR5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524644-B2 Composition and method for forming coating film FUJIFILM CORPORATION (JP) 2013-09-03 — — US disclosed
US-20110034357-A1 COMPOSITION AND METHOD FOR FORMING COATING FILM FUJIFILM CORPORATION (JP) 2011-02-10 — — US disclosed
EP-2267106-A1 COMPOSITION AND METHOD FOR FORMING COATING FILM FUJIFILM Corporation (JP) 2010-12-29 — — EP disclosed
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