SCHEMBL2137705

SCHEMBL2137705

[CH2]CC(O)OC(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965849 0.83 TSHR (0.41)
SCHEMBL28264652 0.82 TSHR (0.38)
SCHEMBL4197867 0.81
SCHEMBL549537 0.81
SCHEMBL26116 0.79
SCHEMBL11233280 0.79 TSHR (0.41)
SCHEMBL11193107 0.79
SCHEMBL27995286 0.79
SCHEMBL4444011 0.78 TSHR (0.41)
SCHEMBL28524913 0.77 TSHR (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1964891-B1 FAST CURING MOLD RELEASE COMPOSITIONS AND METHODS OF PREPARING SAME Henkel IP & Holding GmbH (DE) 2017-03-29 EP claimed
CN-105175740-A Preparation method of polycarboxylic acid water reducer with high workability KEZHIJIE NEW MATERIALS GROUP CO LTD 2015-12-23 CN claimed
US-7897701-B2 Using crosslinked polysiloxane HENKEL CORPORATION (US) 2011-03-01 US claimed
EP-1964891-A1 Fast curing mold release compositions and methods of preparing same HENKEL CORPORATION (US) 2008-09-03 EP claimed
US-20080207818-A1 Fast Curing Mold Release Compositions and Methods of Preparing Same HENKEL CORPORATION (US) 2008-08-28 US claimed
WO-2024138862-A1 COMPOSITION FOR FORMING DIELECTRIC FILM AND USE THEREOF, AND DISPLAY DEVICE 武汉尚赛光电科技有限公司 2024-07-04 WO disclosed
CN-117987004-A Ultraviolet-cured organic silicon hydrophobic coating and preparation method and application thereof 浙江赢科新材料股份有限公司 2024-05-07 CN disclosed
CN-116063637-B Composition for forming dielectric film, application thereof and display device 武汉尚赛光电科技有限公司 2023-09-15 CN disclosed
CN-116063637-A Composition for forming dielectric film, application thereof and display device 武汉尚赛光电科技有限公司 2023-05-05 CN disclosed
EP-4025053-A1 POLYMERS FOR SPRAY DRIFT CONTROL OF PESTICIDE SPRAY BASF SE (DE) 2022-07-13 EP disclosed
WO-2021043642-A1 POLYMERS FOR SPRAY DRIFT CONTROL OF PESTICIDE SPRAY BASF SE (DE) 2021-03-11 WO disclosed
EP-1964891-B1 FAST CURING MOLD RELEASE COMPOSITIONS AND METHODS OF PREPARING SAME Henkel IP & Holding GmbH (DE) 2017-03-29 EP disclosed
US-20080207818-A1 Fast Curing Mold Release Compositions and Methods of Preparing Same HENKEL CORPORATION (US) 2008-08-28 US disclosed
CN-1308487-C Rust inhibitor and rust inhibiting method using the same OTSUKA CHEMICAL CO LTD (JP) 2007-04-04 CN disclosed
CN-1650049-A Rust inhibitor and rust inhibiting method using the same OTSUKA CHEMICAL CO LTD (JP) 2005-08-03 CN disclosed
EP-0028406-A1 Copolymerizable, ultraviolet light absorber N-benzothiazoloazines GAF CORPORATION (US) 1981-05-13 EP disclosed
US-4260809-A Copolymerizable, ultraviolet light absorber 4-alkoxy-2'-acryloxy benzazines GAF CORPORATION (US) 1981-04-07 US disclosed
US-4260768-A Copolymerizable, ultraviolet light absorber 2-(2H-benzotriazol-2-yl)-4-alkylphenol acrylic acid esters GAF CORPORATION (US) 1981-04-07 US disclosed
US-4247714-A Copolymerizable, ultraviolet light absorber 4-acryloyloxybenzal-1-alkyl-1-phenylhydrazone GAF CORPORATION (US) 1981-01-27 US disclosed
US-4233441-A Copolymerizable, ultraviolet light absorber 4-acryloxybenzal-3-alkyl-2 N-benzothiazoloazines GAF CORPORATION (US) 1980-11-11 US disclosed