⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinic Acid SCHEMBL28408595 | 0.90 | TSHR (0.36) | — | |
| SCHEMBL28618910 | 0.90 | TSHR (0.36) | — | |
| SCHEMBL20957533 | 0.84 | TSHR (0.34) | — | |
| SCHEMBL8965849 | 0.83 | TSHR (0.41) | — | |
| SCHEMBL2119381 | 0.82 | TSHR (0.45) | — | |
| SCHEMBL2137705 | 0.81 | — | — | |
| SCHEMBL549537 | 0.81 | — | — | |
| SCHEMBL21625758 | 0.80 | LMNA (0.40) | — | |
| SCHEMBL4282348 | 0.80 | LMNA (0.40) | — | |
| Alcohol SCHEMBL1914433 | 0.80 | TSHR (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112987519-B | Toner and two-component developer | 佳能株式会社 | 2024-12-27 | — | — | CN | disclosed |
| CN-117412998-A | Compositions comprising cyclic imide-containing monomers and organoborane complexes, and related articles and methods | 3M创新有限公司 | 2024-01-16 | — | — | CN | disclosed |
| CN-116964228-A | Composition and method for waterproofing leather | 斯塔尔国际有限公司 | 2023-10-27 | — | — | CN | disclosed |
| CN-113943436-B | Preparation method of solvent-resistant high-dielectric-constant insulating layer capable of being simply patterned | 郑州大学 | 2023-06-02 | — | — | CN | disclosed |
| EP-3336530-B1 | SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING SAME, AND SENSOR IN WHICH SAME IS USED | TORAY INDUSTRIES (JP) | 2022-08-10 | — | — | EP | disclosed |
| US-11002705-B2 | Semiconductor element, method for manufacturing same, and sensor in which same is used | TORAY INDUSTRIES, INC. (JP) | 2021-05-11 | — | — | US | disclosed |
| CN-107923867-B | Semiconductor element, method for manufacturing the same, and sensor using the same | 东丽株式会社 | 2021-04-09 | — | — | CN | disclosed |
| CN-106547168-B | Black matrix material composition and application | 深圳市华星光电技术有限公司 | 2020-09-01 | — | — | CN | disclosed |
| US-10760035-B2 | Detergents and cleaning products containing a polymer active ingredient | Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2020-09-01 | — | — | US | disclosed |
| CN-110531582-A | Hardening resin composition and application thereof | NIPPON CATALYTIC CHEM IND | 2019-12-03 | — | — | CN | disclosed |
| US-7384491-B2 | Apparatus and methods for making crosslinked elastic laminates | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2008-06-10 | — | — | US | disclosed |
| EP-1926594-A1 | APPARATUS AND METHODS FOR MAKING CROSSLINKED ELASTIC LAMINATES | Kimberly-Clark Worldwide, Inc. (US) | 2008-06-04 | — | — | EP | disclosed |
| EP-1827819-A1 | HIGH PERFORMANCE ELASTIC MATERIALS MADE USING STYRENE BLOCK COPOLYMERS AND MIXTURES | Kimberly-Clark Worldwide, Inc. (US) | 2007-09-05 | — | — | EP | disclosed |
| WO-2007030170-A1 | APPARATUS AND METHODS FOR MAKING CROSSLINKED ELASTIC LAMINATES | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2007-03-15 | — | — | WO | disclosed |
| US-20070044905-A1 | Apparatus and methods for making crosslinked elastic laminates | KIMBERLY-CLARK WORLDWIDE, INC. | 2007-03-01 | — | — | US | disclosed |
| WO-2006071321-A1 | HIGH PERFORMANCE ELASTIC MATERIALS MADE USING STYRENE BLOCK COPOLYMERS AND MIXTURES | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2006-07-06 | — | — | WO | disclosed |
| US-20060135024-A1 | High performance elastic materials made using styrene block copolymers and mixtures | KIMBERLY-CLARK WORLDWIDE, INC. | 2006-06-22 | — | — | US | disclosed |
| CN-1269809-A | Epoxy resin composition | CIBA SC HOLDING AG (CH) | 2000-10-11 | — | — | CN | disclosed |
| US-4650743-A | PHOTOPOLYMERIZED HYDROZYALKYL ACRYLATE AND OLIGOMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-03-17 | — | — | US | disclosed |
| EP-0210638-A2 | Optical coating composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-02-04 | — | — | EP | disclosed |