SCHEMBL21392211

SCHEMBL21392211

CC(C)(C)C(C)(C(=O)OC12CC3CC(O)(CC(O)(C3)C1)C2)C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.32
CYP19A1 P11511 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14231490 0.87 CYP17A1 (0.33) CYP17A1CYP19A1
SCHEMBL4759735 0.86 CYP17A1 (0.36) CYP17A1CYP19A1
SCHEMBL14707442 0.84 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL11890188 0.83 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL107655 0.83 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL19819923 0.81 DPP4 (0.31) CYP17A1CYP19A1
SCHEMBL12889902 0.81 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL14527003 0.80 CYP17A1 (0.30) CYP17A1CYP19A1
SCHEMBL18845039 0.80 CYP17A1 (0.30) CYP17A1CYP19A1
SCHEMBL13287164 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11198748-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-14 US disclosed
US-20190292287-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-09-26 US disclosed